Laser induced damage threshold（LIDT）is an important index to measure the anti-laser action of thin films optical components，and its size is affected by various factors such as pulsed laser output parameters，laser action modes， film materials and preparation methods，and damage identification methods. Using K9 glass as the substrate，ion beamassisted thermal evaporation deposition methods are used to prepare three kinds of single-layer thin film samples of silicon dioxide，hafnium dioxide，and titanium dioxide. The experiments are performed on an independently developed multiwavelength laser damage threshold tester. In the 1-on-1 measurement method，the damage thresholds of three materials are tested with pulsed lasers with wavelengths of 1 064 nm and 532 nm，respectively，and the influence of damage thresholds at different wavelengths is analyzed. In this dissertation，the damage thresholds of three kinds of thin film materials under different pulsed laser wavelengths and their changes are experimentally studied. The test results show that the damage threshold of the three films decreases with the decrease of the laser wavelength，when the film thickness is fixed or the film thickness is changed. The test results are in line with theoretical expectations. The influence of different wavelengths on the damage of dielectric films has important guiding significance for film preparation and damage identification.