Chinese Journal of Lasers, Volume. 37, Issue 2, 385(2010)

Activation Technique of GaN Negative Electron Affinity Photocathode

Du Xiaoqing1、*, Chang Benkang2, Qian Yunsheng2, Fu Rongguo2, Gao Pin2, and Qiao Jianliang2
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  • 1[in Chinese]
  • 2[in Chinese]
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    Metal organic chemistry vaporation deposition (MOCVD) epitaxial p-type GaN layer is used as emission material of GaN photocathode. By using on-line measurement of photocurrent in activation process,the influences of Cs activation,Cs/O alternate activation and high-low temperature two-step activation techniques on photoemission performance of GaN photocathode are investigated. The experimental results show that GaN photocathode can obtain about 20% quantum efficiency only by Cs activation,and the quantum efficiency can be increased slightly by two or three Cs/O cycles. But the high-low two-step activation technique can not increase the quantum efficiency. The experimental phenomena are explained by the dipole surface model.

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    Du Xiaoqing, Chang Benkang, Qian Yunsheng, Fu Rongguo, Gao Pin, Qiao Jianliang. Activation Technique of GaN Negative Electron Affinity Photocathode[J]. Chinese Journal of Lasers, 2010, 37(2): 385

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    Paper Information

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    Received: Apr. 9, 2009

    Accepted: --

    Published Online: Feb. 3, 2010

    The Author Email: Xiaoqing Du (duxq@cqu.edu.cn)

    DOI:10.3788/cjl20103702.0385

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