In order to study the effect of the substrate temperature on the electrochromic properties of NiOx film, DC reaction magnetron sputtering method was used to prepare NiOx film at different substrate temperatures, i. e, room temperature, 50, 100, 200 and 300 ℃ . The properties of the films including structure and morphology, cyclic stability, optical modulation rate, memory effect, response time, and adhesion to the substrate were explored and compared. The results show that the effect of the substrate temperature on the electrochromic properties of NiOx film is complicated. NiOx film prepared at 100 ℃ shows low charge capacity density decay rate, good memory effect, fast response speed, high modulation rate and good adhesion to the substrate. This study may have certain reference significance for the design and fabrication of NiOx -based electrochromic devices.