Chinese Optics Letters, Volume. 2, Issue 1, 0104(2004)
Laser writing system for fabrication of diffractive optics elements
We report a laser writing system for fabrication of diffractive optical elements with He-Cd laser. The wavelength of the light source is 441.6 nm. The output beam is collimated into parallel light with uniform intensity distribution after passing through the spatial filter with a pinhole of 25 um and the collimating device. A microscopy objective lens with numerical aperture (NA) of 0.65 is used to focus the beam into a small diffraction spot. Any pattern can be written with this system. Experimental results are presented. The written gratings and the phase patterns were verified with a conventional optical microscopy and the Taylor Hobson equipment.
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Xiaohui Sun, Changhe Zhou, Huayi Ru, Yanyan Zhang, Bingkun Yu, "Laser writing system for fabrication of diffractive optics elements," Chin. Opt. Lett. 2, 0104 (2004)