Chinese Journal of Lasers, Volume. 29, Issue s1, 486(2002)
Effect of Ion Sputtering on the Characteristics of Optical Thin Films
By the means of ion sputtering, the optical anti-reflective thin films are deposited. Through the measurement of these thin films, the characteristics such as surface morphology, refraction index, weak absorption, structure, etc., have been analyzed. And the feature of ion sputtering and its adaptation is pointed out.
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WANG Ying-jian, YI Kui, SONG Yong-xiang, LI Qing-guo, FAN Zheng-xiu. Effect of Ion Sputtering on the Characteristics of Optical Thin Films[J]. Chinese Journal of Lasers, 2002, 29(s1): 486
Category: laser devices and laser physics
Received: --
Accepted: --
Published Online: Feb. 23, 2013
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CSTR:32186.14.