Chinese Journal of Liquid Crystals and Displays, Volume. 36, Issue 3, 398(2021)
Wedge-shaped bevel microstructure prepared by dislocation and superposition exposure method
A kind of exposure method of dislocation and superposition was studied, which was based on a type of positive photoresist produced by T company. It can realize the effect of gray scale exposure by the method and finally a wedge-shaped bevel microstructure with specific angle was obtained. The absorption coefficient of a photoresist can be changed after irradiated by ultraviolet light. According to the Lambert-Beer law, the bevel structure can be equivalent into step structure, and then the critical exposure energy for the photoresist to react and the absorption coefficients of the photoresist can be calculated, which was irradiated by UV before and after, as well as the exposure energy for the dislocation and superposition method. Experimental results show that the critical exposure energy for the photoresist to react is 8 mJ, and the absorption coefficient α of the photoresist for ultraviolet light is 1.14, which will reduce for 20% after irradiated by ultraviolet light. With irradiating by the energy calculated, the photoresist can form the wedge bevel structure with taper angle of 32°. A specific wedge bevel structure by the dislocation and superposition exposure method can be prepared and the energy can be calculated according to the taper angle of bevel structure.
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DONG Li-wen, SONG Xiao-xin, GU Ren-quan, ZHANG Feng, YUAN Guang-cai, YAO Qi, LYU Zhi-jun, LIU Wen-qu, CUI Zhao. Wedge-shaped bevel microstructure prepared by dislocation and superposition exposure method[J]. Chinese Journal of Liquid Crystals and Displays, 2021, 36(3): 398
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Received: Jul. 15, 2020
Accepted: --
Published Online: Sep. 3, 2021
The Author Email: DONG Li-wen (dongliwen@boe.com.cn)