Frontiers of Optoelectronics, Volume. 7, Issue 1, 77(2014)

Edge effect of optical surfacing process with different data extension algorithms

Yang LIU1, Haobo CHENG1、*, Zhichao DONG1, and Hon-Yuen TAM2
Author Affiliations
  • 1School of Optoelectronics, Beijing Institute of Technology, Beijing 100081, China
  • 2Department of Mechanical and Biomedical Engineering, City University of Hong Kong, Hong Kong, China
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    This study presents a strategy which integrates extra polishing path (EPP) and error map extension to weaken the edge effect in the ultraprecise optical surfacing process. Different data extension algorithms were presented and analyzed. The neighbor-hood average can be selected as the frequently-used method, as it has not bad precision and time-saving performance for most surface forms through the simulation results and practical experiment. The final error map was obtained, its peak-to-valley (PV) was 0.273l and root mean square (RMS) was 0.028l (l=632.8 nm). The edge effect was weakened and suppressed well through the experiment.

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    Yang LIU, Haobo CHENG, Zhichao DONG, Hon-Yuen TAM. Edge effect of optical surfacing process with different data extension algorithms[J]. Frontiers of Optoelectronics, 2014, 7(1): 77

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    Paper Information

    Received: Dec. 2, 2013

    Accepted: Dec. 20, 2013

    Published Online: Jul. 10, 2014

    The Author Email: Haobo CHENG (chenghaobo@tsinghua.org.cn)

    DOI:10.1007/s12200-014-0393-7

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