Journal of Advanced Dielectrics, Volume. 14, Issue 2, 2440002(2024)

Effect of annealing conditions on surface morphology and ferroelectric domain structures of BiFeO3 thin films

Minchuan Liang1, Jia Yang1, Huayu Yang1, Chen Liang1, Zhenyue Nie1, Hui Ai2, Tong Zhang3, Ji Ma3, Houbing Huang1, and Jing Wang1、*
Author Affiliations
  • 1Advanced Research Institute of Multidisciplinary Science and School of Materials Science and Engineering, Beijing Institute of Technology, Beijing 100081, P. R. China
  • 2Analysis and Testing Center, Beijing Institute of Technology, Beijing 100081, P. R. China
  • 3School of Material Science and Engineering, Kunming University of Science and Technology, Kunming, Yunnan 650093, P. R. China
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    Ferroelectric materials are widely used in the applications of electronic devices due to their robust spontaneous polarization. The surface roughness of ferroelectric thin films, which is closely related to the morphology, can play an important role in determining the ferroelectric domain structures. In this work, we have investigated the influence of annealing conditions on the surface morphology of epitaxial BiFeO3 and SrRuO3 thin films prepared by pulsed laser deposition on SrTiO3 (001) substrates. It is found that the morphology of the thin films is sensitive to the annealing time and cooling rate, and the corresponding surface roughness decreases with increasing annealing time and decreasing cooling rate. In addition, the ferroelectric domain structures of BiFeO3 films have been investigated by piezoelectric force microscopy, which shows a significant improvement in domain size and reverse piezoelectric response in the thin films with decreasing surface roughness. This work provides a simple way to predict and improve the ferroelectric domain structures by in situ annealing.

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    Minchuan Liang, Jia Yang, Huayu Yang, Chen Liang, Zhenyue Nie, Hui Ai, Tong Zhang, Ji Ma, Houbing Huang, Jing Wang. Effect of annealing conditions on surface morphology and ferroelectric domain structures of BiFeO3 thin films[J]. Journal of Advanced Dielectrics, 2024, 14(2): 2440002

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    Paper Information

    Category: Research Articles

    Received: Nov. 26, 2023

    Accepted: Jan. 14, 2024

    Published Online: May. 24, 2024

    The Author Email: Jing Wang (jwang@bit.edu.cn)

    DOI:10.1142/S2010135X24400022

    CSTR:32405.14.S2010135X24400022

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