Chinese Journal of Lasers, Volume. 17, Issue 11, 690(1990)
A new dielectric facet protector and AR film for semiconductor light-emitting devices
Experimental results are presented for the first time for sputtered AIN film which is a protector and AR film on the facet of semiconductor light-emitting devices. The technical conditions for obtaing sputtered AIN film and its properties are given.
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[in Chinese], [in Chinese]. A new dielectric facet protector and AR film for semiconductor light-emitting devices[J]. Chinese Journal of Lasers, 1990, 17(11): 690