Sources at frequencies between 0.1 and 10 THz have applications in the medical fields, various measurement, non-destructive evaluation, security, wireless communications, and so on[
Chinese Optics Letters, Volume. 14, Issue 1, 011406(2016)
1.5 μm dual-lateral-mode distributed Bragg reflector laser for terahertz excitation
A terahertz excitation source based on a dual-lateral-mode distributed Bragg reflector (DBR) laser working in the 1.5 μm range is experimentally demonstrated. By optimizing the width of the ridge waveguide, the fundamental and the first-order lateral modes are obtained from the laser. The mode spacing between the two modes is 9.68 nm, corresponding to a beat signal of 1.21 THz. By tuning the bias currents of the phase and DBR sections, the wavelengths of the two modes can be tuned by 2 nm, with a small strength difference (
Sources at frequencies between 0.1 and 10 THz have applications in the medical fields, various measurement, non-destructive evaluation, security, wireless communications, and so on[
Up until now, much effort has been made to realize terahertz beat sources. Several monolithic laser structures have been demonstrated to emit two longitudinal modes simultaneously. A multi-section distributed feedback (DFB) laser has been proposed to provide a large frequency tuning range from tens of gigahertz to terahertz[
In this Letter, we demonstrate a 1.5 μm dual-lateral-mode distributed Bragg reflector (DBR) laser for terahertz mode beating. By taking advantage of the low-loss transmission window of the optical fiber, the two modes of the laser can be delivered to a photo-mixer located a long distance away, so as to realize a remote terahertz carrier transmission. It is also possible to integrate this device with other semiconductor devices, such as waveguide-type terahertz photo-mixers, semiconductor optical amplifiers, and electro-absorption modulators based on InP materials. Detailed simulations were carried out to investigate the effect of the ridge width on the generated beating frequency. By optimizing the width of the ridge waveguide, a 3.5 μm ridge was chosen to lower the optical confinement of the laser waveguide in the lateral direction and support both the fundamental mode and the first-order lateral mode. The generated two lateral modes had a mode spacing of 9.68 nm, corresponding to beating frequency of 1.21 THz. By adjusting the injected currents, the working wavelengths of the device can be tuned by 2 nm, and the beating frequency can be switched between 1.11 and 1.21 THz. Moreover, the power balance between the two modes was below 5 dB, and the side-mode suppression ratio (SMSR) is over 45 dB. Detailed investigations of this device, including near-field patterns, the spectral behavior, and autocorrelation characterization experiments, are reported.
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The schematic illustration of the dual-lateral-mode ridge-waveguide DBR laser is shown in Fig.
Figure 1.Schematic diagram of the dual-mode DBR laser-packaged device.
Figure 2.Material structure schematic diagram of the ridge laser.
Figure 3.Near-field mode pattern of the laser with (a) 2 μm ridge, supporting only the fundamental mode, (b) 3.5 μm ridge, supporting both the fundamental mode and the first-order mode, and (c) 6 μm ridge, supporting the fundamental mode, the first-order mode, and the second-order mode.
Two lateral modes with different EFIs would induce two Bragg wavelengths. To optimize the beating frequency, the EFIs of different modes as a function of the ridge width were investigated through 3D BPM. In the simulation, the material refractive indexes of 1.2Q InGaAsP and InP were set as 3.339 and 3.167, respectively, at a free space wavelength of 1.5 μm. Detailed parameters of each layer of the device module are listed in Table
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Figure 4.Beating frequency of the fundamental mode and the first-order mode as a function of the ridge width. Inset (a) is the cross section of the material layers; (b) and (c) are the mode distributions of the fundamental mode and the first-order mode, respectively.
Based on the above simulation analysis, a batch of devices was fabricated. The laser structure was grown by metal organic chemical vapor deposition in two steps. First, the epitaxial structure with five pairs of compressively strained InGaAsP MQW was grown on a S-doped n-type InP (100)-oriented substrate. A bandgap wavelength shift of 90 nm between the gain sections and the passive waveguide regions was realized by using quantum well intermixing technology. The DBR gratings were defined holographically on the grating region of the upper confinement hetero-junction (SCH) layer. The next epitaxial step was to grow a p-type cladding InP layer and a p-InGaAs contact layer on the upper SCH layer. By etching the p-InGaAs layer off and through He+ implantation, the electrical isolation process was accomplished. A Ti-Au metal layer was sputtered on the p-InGaAs contact layer to form a p-electrode. Then, the substrate was thinned, and the Au-Ge-Ni metal evaporated on the backside. The n-electrode was formed after rapid temperature annealing. Finally, a 3.5 μm ridge waveguide was formed by wet etching to support the first-order lateral mode.
In the measurement, the cleaved device was mounted on a Cu heat sink, and the working temperature was maintained at 15°C by a thermoelectric cooler (TEC). The laser from the facet of the gain section was coupled out by a tapered single-mode fiber and monitored by an optical spectrum analyzer (Advantest Q8384) and an autocorrelator (A.P.E. pulse check).
First, the optical spectra and the near-field patterns were investigated. Figure
Figure 5.Map of the output optical spectra when only the gain current was tuned.
Figure 6.(a) Typical output spectrum of the device in (a) the fundamental mode and (b) the dual-mode state. The insets show the near-field intensity distribution in (a) the fundamental mode operation state, and (b) the dual-lateral-mode operation state.
To further verify the lasing mode state, the near-field distributions of different working states were characterized by an infrared CCD. The insets of Figs.
Figure 7.(a) Autocorrelation trace of the device, where the wavelength difference between the two modes is 9.68 nm, corresponding to 1.21 THz at
Figure 8.Beating frequency (a) and corresponding peak wavelengths (b) as a function of the
Figure 9.Peak wavelengths as a function of
In conclusion, a dual-lateral-mode DBR laser as a terahertz excitation generator in the 1.5 μm range is designed and fabricated. Two wavelengths corresponding to two lateral modes are obtained in the 1.5 μm range. The mode-beating frequency can be switched between 1.11 and 1.21 THz by adjusting the bias currents of the device. Detailed investigations of this device, including the near-field pattern, the spectral behavior, and autocorrelation trace, are performed.
[1] D. Saeedkia. Handbook of Terahertz Technology for Imaging, Sensing and Communications, 91-117(2013).
[13] M. Sun, S. Tan, F. Guo, S. Liu, D. Lu, C. Ji. Lasers Optoelectron. Prog., 52, 091302(2015).
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Limgeng Zhang, Liqiang Yu, Biwei Pan, Dan Lu, Jiaoqing Pan, Lingjuan Zhao, "1.5 μm dual-lateral-mode distributed Bragg reflector laser for terahertz excitation," Chin. Opt. Lett. 14, 011406 (2016)
Category: Lasers and Laser Optics
Received: Sep. 29, 2015
Accepted: Nov. 6, 2015
Published Online: Aug. 6, 2018
The Author Email: Dan Lu (ludan@semi.ac.cn), Lingjuan Zhao (ljzhao@semi.ac.cn)