To ensure display stability of LCD in a certain process fluctuating range, LC Margin is usually estimated for new products developing. Especially, the property of photo spacer (PS) mattered significantly for LC Margin. This work focuses on influence factors of PS characters. First of all, the relationship between ambient temperature and PS Young’s modulus is analyzed to detect their variety trend. Then, the influence of process temperature on PS elastic recovery ratio(PS ER) is studied. Finally, the elastic recovery rate of PS with same specific characters at different cell gap is discnssed. Related experiment results indicates that PS Young’s modulus decreases with the increasing of ambient temperature, and the PS ER increases slightly with the in creasing of process temperature. On the other hand, the PS in higher cell gap recovers a little more quickly refer to lower cell gap.