In order to improve the sensitivity of fluorescence biosensing and solve the near-field limitations to enhancement when the fluorescent nanoparticle is in the structures far-field range, a large-scale hybrid metal-dielectric structure(Ag-Si structure) is proposed to enhance fluorescence in the far-field range.This hybrid metal-dielectric structure is different from previous metal-dielectric structures because it achieves fluorescence enhancement when the fluorescent nanoparticle is in the structures far-field range due to scattering and interference. In this paper, the Ag-Si structure is investigated with respect to its excitation process and the emission process using the Finite-Difference Time-Domain (FDTD) method. In the excitation process, the intensity of the Ag-Si structures fluorescence is higher than that of the bare glass structure and the electric field distribution of the Ag-Si structure is more uniform in the slit between the two pillars than it is in the metal structure (Ag structure). With this structure, fluorescence enhancement can be achieved and its detection of molecular motion behavior is more accurate. In the emission process, fluorescence enhancement in the Ag-Si structure is higher than that of the bare glass structure when the fluorescent nanoparticle is in the structures far-field range. The mechanisms that achieve fluorescence enhancement in the Ag-Si structure are scattering and interference. Fluorescence is scattered upward by the silver film while the silver and silicon pillars on both sides of the structure simultaneously scatter the partial fluorescence, then the fluorescence interferes and propagates to the far-field to achieve fluorescence enhancement.Further advocating its use, an Ag-Si structure is simple to fabricate and integrate, allowing seamless application in biosensing.