Researches of ultraviolet band optical thin films are significant important in both military and civilian fields. Domestic and international researches about ultraviolet film often use high and low refractive index materials to alternately plat dielectric layer structures. The disadvantage is that the cutoff level in visible band is not good, so there will be large amount of background noise. Aim at this problem, this paper uses the coating design theory and adopts an induced transmission filter structure based on the thin film of ultraviolet material properties, coating optimization design technology, deposition and testing technology. Through repeated theoretical calculation and simulation experiments, process parameters of different materials are optimized. We deposit the ultraviolet induced filter which transmits at 265 nm and cutoffs at 300～1000 nm.