A technology based on plasma etching has been developed to produce antireflective surface structures. By choosing thin initial layers and variable plasma conditions, a broad range of nanostructures can be obtained on various polymers. Specifically, a broadband antireflective effect can be achieved, which is less sensitive to incident angles of light compared to multilayer interference coatings. In addition, plasma etching of antireflective structures has been proven highly cost-effective during replication, especially for mass production, and may be a suitable alternative to common coating procedures.