Through a technique mainly consisting of single mask ultraviolet (UV) photolithography, inductively coupled plasma (ICP) etching and KOH∶H2O chemical etching, refractive microoptics structure array of 5×5 over silicon wafer is fabricated. The fine patterns fabricated over silicon substrate are transferred into nickel mask by electrochemical method. The fine pattern structures over nickel mask are further copied into plastic materials by embossing operation. Photomask is composed of a large number of microholes with typical structural size in micrometer order, which are distributed by the algorithm. The surface profile characteristics of the fabricated refractive micro-optics structures are obtained by surface measurements. Through common optical measurement, emitted complex wavefronts are discussed and analyzed.