Femtosecond laser induced breakdown spectroscopy (fs-LIBS) is employed to analyze Cu-Al sputtered thin films. The laser induced plasma spectra at different delay time (0~1000 ns) and gate width (100~1000 ns) are obtained. The Stark broadening effects are analyzed for the Al I line at 396.2 nm. Quantitative component analysis for the thin films is carried out with the calibration curve (CC) and the calibration free (CF) method, respectively. The composition difference between the thin films and corresponding targets is compared as well. Additionally, depth profiling is carried out for Al67Cu33 thin films using fs-LIBS combined with a synchronous real-time reflectivity monitoring sub-system. An average ablation depth of 90 nm per pulse is observed at the laser energy of 0.2 mJ.