Chinese Optics Letters, Volume. 7, Issue 9, 865(2009)

Plasma channel formed by ultraviolet laser pulses at 193 nm in air

Yuanyuan Ma1,2, Xin Lu1, Tingting Xi2,3, Qihuang Gong1, and Jie Zhang1,2,4
Author Affiliations
  • 1State Key Laboratory for Mesoscopic Physics, Department of Physics, Peking University, Beijing 100871, China
  • 2Laboratory of Optical Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China
  • 3Department of Physics, Graduate University of Chinese Academy of Sciences, Beijing 100049, China
  • 4Department of Physics, Shanghai Jiao Tong University, Shanghai 200240, China
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    The propagation of picosecond deep ultraviolet laser pulse at wavelength of 193 nm in air is numerically investigated. Long plasma channel can be formed due to the competition between Kerr self-focusing and ionization induced defocusing. The plasma channel with electron density of above 10<sup>13</sup>/cm<sup>3</sup> can be formed over 70 m by 50-ps, 20-mJ laser pulses. The fluctuation of laser intensity and electron density inside ultraviolet (UV) plasma channel is significantly lower than that of infrared pulse. The linear absorption of UV laser by air is considered in the simulation and it is shown that the linear absorption is important for the limit of the length of plasma channel.

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    Yuanyuan Ma, Xin Lu, Tingting Xi, Qihuang Gong, Jie Zhang, "Plasma channel formed by ultraviolet laser pulses at 193 nm in air," Chin. Opt. Lett. 7, 865 (2009)

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    Paper Information

    Received: May. 12, 2009

    Accepted: --

    Published Online: Sep. 22, 2009

    The Author Email:

    DOI:10.3788/COL20090709.0865

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