Journal of Synthetic Crystals, Volume. 54, Issue 3, 361(2025)

Review on Mg Doping of Ga2O3

SUN Rujun1,2、*, ZHANG Jinghui1,2, LI Yifan1,2, HAO Yue1,2, and ZHANG Jincheng1,2
Author Affiliations
  • 1National Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, Xidian University, Xi'an 710071, China
  • 2Faculty of Integrated Circuit, Xidian University, Xi'an 710071, China
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    Gallium oxide (Ga2O3) possesses an ultra-wide bandgap and high breakdown electric field, making it promising for applications in power electronic devices and optoelectronic devices. Although Ga2O3 lacks p-type conductivity, we can still utilize p-type doping to control and design electrical properties by energy band engineering. The p-type dopants for gallium oxide that have been experimentally verified include Mg, Fe, N, Zn, Cu, Ni, Co, etc. Among the p-type dopants of Ga2O3, Mg is extensively studied due to its lowest formation energy, closest energy level to the valence band top, and multiple doping methods. This paper focuses on Mg doping β-Ga2O3. Firstly, the theoretical computational understanding and experimental test results of the acceptor levels of Mg-doped Ga2O3 are reviewed. Secondly, various doping methods, doping concentrations, and key issues such as Mg diffusion during thermal treatment for semi-insulating single crystals and epitaxial layers of Mg-doped β-Ga2O3 are summarized. Finally, it is pointed out that further investigations are needed on the mechanisms of Mg incorporation, activation and diffusion.

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    SUN Rujun, ZHANG Jinghui, LI Yifan, HAO Yue, ZHANG Jincheng. Review on Mg Doping of Ga2O3[J]. Journal of Synthetic Crystals, 2025, 54(3): 361

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    Paper Information

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    Received: Nov. 25, 2024

    Accepted: Apr. 23, 2025

    Published Online: Apr. 23, 2025

    The Author Email: SUN Rujun (sunrujun@xidian.edu.cn)

    DOI:10.16553/j.cnki.issn1000-985x.2024.0295

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