High Power Laser and Particle Beams, Volume. 36, Issue 2, 025005(2024)
Investigation of bipolar pulse source based on half-bridge structure
To meet the application requirements of pulsed electric field ablation and solve the problem of uneven distribution of unipolar pulse electric field, a bipolar submicrosecond high voltage pulse power supply with high repetition rate and nanosecond front based on the main circuit of half-bridge structure was developed. The pulse power supply is provided by the FPGA control signal, after amplifying the control signal by the driver chip, the photocoupler is used to drive multiple SiC MOSFETs. The drive circuit requires less components, its signal control timing is simple, and it can provide negative voltage bias, so that the switch tube is reliably turned off, which improves the anti-electromagnetic interference ability of the circuit, guranteeing stable operation of the power supply. Through resistance load experiment, the influence of different gate resistors on the driving voltage is compared and analyzed. The shorter the driving voltage rise time, the faster the bipolar high voltage pulse front is. The experimental results show that the designed high-frequency bipolar pulse power supply can stably generate repetitive bipolar nanosecond pulses on 100 Ω pure resistive load. The output voltage is adjustable from 0 to ±4 kV, the pulse width is adjustable from 0.2 μs to 1.0 μs, the phase delay between positive and negative pulses is adjustable from 0 to 1 ms, and the rising edge and falling edge are between 60 ns and 150 ns. The design structure of the bipolar pulse source circuit is compact, which can meet the application parameter requirements.
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Yingjin Pan, Yiming Xiong, Zi Li, Song Jiang, Junfeng Rao. Investigation of bipolar pulse source based on half-bridge structure[J]. High Power Laser and Particle Beams, 2024, 36(2): 025005
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Received: Sep. 22, 2023
Accepted: Nov. 29, 2023
Published Online: Mar. 21, 2024
The Author Email: Junfeng Rao (raojunfeng1985@163.com)