Chinese Journal of Lasers, Volume. 39, Issue 1, 103005(2012)

Influence of Target-to-Substrate Distance on Velocity and Density Distributions of Ablated Particles during Their Propagations

Ding Xuecheng*, Fu Guangsheng, Zhai Xiaolin, Liang Weihua, Chu Lizhi, Deng Zechao, Zhao Yajun, and Wang Yinglong
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    The influence of the target-to-substrate distance on the spatial density distribution of the particles (Si and He) and the velocity distribution of the Si particles is investigated via Monte Carlo simulation. The results indicate that the distance of the mixed regions from the target increases with the target-to-substrate distance increasing at the same time, and the time of reaching the maximum distance from the target increases with the target-to-substrate distance increasing. The peak positions and intensities of the curves of velocity distributions periodically oscillate and increase with the target-to-substrate distance increasing.

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    Ding Xuecheng, Fu Guangsheng, Zhai Xiaolin, Liang Weihua, Chu Lizhi, Deng Zechao, Zhao Yajun, Wang Yinglong. Influence of Target-to-Substrate Distance on Velocity and Density Distributions of Ablated Particles during Their Propagations[J]. Chinese Journal of Lasers, 2012, 39(1): 103005

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    Paper Information

    Category: laser manufacturing

    Received: Jul. 28, 2011

    Accepted: --

    Published Online: Nov. 23, 2011

    The Author Email: Xuecheng Ding (hddingxc@163.com)

    DOI:10.3788/cjl201239.0103005

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