Journal of Infrared and Millimeter Waves, Volume. 31, Issue 2, 118(2012)

High-k gate oxides integration of graphene based infrared detector

ZHOU Peng, WEI Hong-Qiang, SUN Qing-Qing, YE Li, CHEN Lin, WU Dong-Ping, DING Shi-Jin, and ZHANG Wei
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    This review gives an introduction to the discovery and fabrication of the graphene, back-gated and top-gated GFET with the possible tunable band-gap of 0~250 meV at room temperature for middle and far infrared detector application, radio frequency GFET application and other advanced high k gate oxides integration processes.

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    ZHOU Peng, WEI Hong-Qiang, SUN Qing-Qing, YE Li, CHEN Lin, WU Dong-Ping, DING Shi-Jin, ZHANG Wei. High-k gate oxides integration of graphene based infrared detector[J]. Journal of Infrared and Millimeter Waves, 2012, 31(2): 118

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    Paper Information

    Received: Feb. 24, 2011

    Accepted: --

    Published Online: Apr. 13, 2012

    The Author Email:

    DOI:

    CSTR:32186.14.

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