Journal of Infrared and Millimeter Waves, Volume. 31, Issue 2, 118(2012)
High-k gate oxides integration of graphene based infrared detector
This review gives an introduction to the discovery and fabrication of the graphene, back-gated and top-gated GFET with the possible tunable band-gap of 0~250 meV at room temperature for middle and far infrared detector application, radio frequency GFET application and other advanced high k gate oxides integration processes.
Get Citation
Copy Citation Text
ZHOU Peng, WEI Hong-Qiang, SUN Qing-Qing, YE Li, CHEN Lin, WU Dong-Ping, DING Shi-Jin, ZHANG Wei. High-k gate oxides integration of graphene based infrared detector[J]. Journal of Infrared and Millimeter Waves, 2012, 31(2): 118
Received: Feb. 24, 2011
Accepted: --
Published Online: Apr. 13, 2012
The Author Email:
CSTR:32186.14.