Chinese Journal of Lasers, Volume. 40, Issue s1, 103002(2013)

Thermal Damage Mechanism on CCD Detector Irradiated by Pulsed Laser

Gao Liuzheng1、*, Shao Zhengzheng1, Zhu Zhiwu2, Huang Ren1, and Chang Shengli1
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  • 1[in Chinese]
  • 2[in Chinese]
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    The morpha and spectral character of damaged CCD, which has been irradiated by picosecond pulsed laser, are studied by using scanning electron microscope and micro-Raman spectrometer. Morphological damaged images of different layers are observed on the surface of CCD. The damage sequence is decided by comparing different layers′ conditions with a scale as small as a single pixel. The damage status of W-shield and poly-Si around one pixel is observed. On the cross section, the red-shift of Raman spectrum of bulk silicon material is measured and it means that bulk silicon melts, which brings a short-circuit between surface poly-Si electrode and substrate. The short-circuit explains the thermal mechanism of complete failure.

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    Gao Liuzheng, Shao Zhengzheng, Zhu Zhiwu, Huang Ren, Chang Shengli. Thermal Damage Mechanism on CCD Detector Irradiated by Pulsed Laser[J]. Chinese Journal of Lasers, 2013, 40(s1): 103002

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    Paper Information

    Category: laser manufacturing

    Received: May. 21, 2013

    Accepted: --

    Published Online: Nov. 5, 2013

    The Author Email: Liuzheng Gao (gaoliuzheng@126.com)

    DOI:10.3788/cjl201340.s103002

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