Laser & Optoelectronics Progress, Volume. 61, Issue 23, 2312005(2024)
Research on Ultrashort Pulse Laser System Chromatic Aberration Measurement Based on Wavelength Scanning Holographic Technology
For the measurement of chromatic aberration in high power laser systems, this article proposed a chromatic aberration measurement technology for ultrashort pulse laser system based on wavelength scanning holographic interferometry to obtain wavefront and defocus dispersion information at different wavelengths. Chromatic dispersion information of different wavelengths were obtained using a Zernike polynomial fitting. Chromatic aberration introduced by the chromatic aberration compensation unit was accurately measured. Results were in good agreement with the theoretical simulation results, defocus chromatic aberrations at longer and shorter wavelengths were negative and positive, respectively. The precision of proposed method was validated by comparing focal points at different wavelengths. Proposed method could effectively measure chromatic aberration in ultrashort pulse laser systems, and provide accurate data support for the precise control of chromatic aberration compensation.
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Zhaoliang Li, Ping Zhu, Dongjun Zhang, Jun Kang, Xinglong Xie, Jianlang Li, Dean Liu, Jianqiang Zhu, Dawei Zhang. Research on Ultrashort Pulse Laser System Chromatic Aberration Measurement Based on Wavelength Scanning Holographic Technology[J]. Laser & Optoelectronics Progress, 2024, 61(23): 2312005
Category: Instrumentation, Measurement and Metrology
Received: Mar. 7, 2024
Accepted: Apr. 7, 2024
Published Online: Nov. 15, 2024
The Author Email: Ping Zhu (zhp1990@siom.ac.cn), Jianlang Li (lijianlang@usst.edu.cn)
CSTR:32186.14.LOP240941