Polymer microlens array with self-written waveguides is fabricated with SU-8 material which is a kind of epoxy based photoresist. Melting photoresist and image transferring are employed to fabricate the microlens array. Because of the melting and attendant expanding process of the photoresist, the actual fill factor of the array exceeds the design one, which is 0.749. SU-8 photoresist and glass substrate are separated by a layer of polydimethylsiloxane (PDMS) due to the strong bonding force between them. With the good separation effect of PDMS film, UV-cured SU-8 microlens array is obtained without mechanical damage. Profile, performance of the light spots at the end of the self-written waveguides and their uniformity are observed and tested. It is concluded that the SU-8 microlens array with self-written waveguides is fine, it images the filament of the metallographic microscope well and its light spots at the end of the waveguide are of high uniformity. By using this polymer microlens array, the assembling between the microlens array and detector array is expected to be achieved easily. This polymer microlens array has great potential applications in many optoelectronic devices.