Chinese Optics Letters, Volume. 7, Issue 4, 04274(2009)
Efficient 1.3-\mum electroluminescence from high concentration boron-diffused silicon p+-n junctions
Electroluminescence peaking at 1.3 \mum is observed from high concentration boron-diffused silicon p+-n junctions. This emission is efficient at low temperature with a quantum efficiency 40 times higher than that of the band-to-band emission around 1.1 \mum, but disappears at room temperature. The 1.3-\mum band possibly originates from the dislocation networks lying near the junction region, which are introduced by high concentration boron diffusion.
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Ting Chen, Guangzhao Ran, Liping You, Huabo Zhao, Guogang Qin, "Efficient 1.3-\mum electroluminescence from high concentration boron-diffused silicon p+-n junctions," Chin. Opt. Lett. 7, 04274 (2009)
Received: Dec. 17, 2008
Accepted: --
Published Online: Apr. 27, 2009
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