A Schwarzschild microscope working at 13.5 nm was developed. According to the theory of a coaxial two-mirror system, the optical structure of Schwarzschild objective was designed by eliminating third-order spherical aberrations, coma and astigmatism. Experiments show that the spatial resolution of the designed objective achieves 550 lp/mm within the field of ±0.3 mm with respect to the calculation of modulation transfer function. Based on the working wavelength and incidence angle of lights,the Mo/Si multilayer optics with the reflectivity of 61% at 13.5 nm was designed and fabricated. In order to remove visible and ultraviolet lights,a filter with materials of Zr, Si and Si3N4 was designed and fabricated,and the transmittance of 21.1% was obtained at 13.5 nm. With the purpose of demonstrating the resolution of microscope, the 60 lp/mm grid backlit by laser produced plasma was imaged via the Schwarzschild microscope on a Charge Coupled Device (CCD), and the results show that the imaging system can offer the resolution of 3 μm in the 0.5 mm field.It concludes that the resolution of imaging experiment is limited by the resolution of CCD camera.