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Acta Optica Sinica, Volume. 7, Issue 2, 159(1987)

General consideration of optical system in the projection aligner

WANG ZHIJIANG and ZOU HAIXING
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    The specific parameters of main optical system are deduced from the requirement of pattern transfer for the projection aligner. The limit of these parameters is discussed.

    Keywords
    optical systemscan projection aligner
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    WANG ZHIJIANG, ZOU HAIXING. General consideration of optical system in the projection aligner[J]. Acta Optica Sinica, 1987, 7(2): 159

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    Paper Information

    Category: Optical Design and Fabrication

    Received: May. 6, 1986

    Accepted: --

    Published Online: Sep. 20, 2011

    The Author Email:

    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology