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Opto-Electronic Engineering, Volume. 34, Issue 12, 113(2007)

Two-mirror system design study of reduced projection optics for EUV Lithography

[in Chinese]1,2, [in Chinese]1, and [in Chinese]1
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  • 2[in Chinese]
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    [in Chinese], [in Chinese], [in Chinese]. Two-mirror system design study of reduced projection optics for EUV Lithography[J]. Opto-Electronic Engineering, 2007, 34(12): 113

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    Received: Mar. 6, 2007

    Accepted: --

    Published Online: Aug. 17, 2008

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    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology