Laser & Optoelectronics Progress, Volume. 62, Issue 1, 0100001(2025)

Research Progress on Surface Contamination and Cleaning Techniques of Extreme Ultraviolet Multilayer Coatings

Kai Huang1,2、*, Tingting Zeng1, Jianda Shao1, and Meiping Zhu1,2
Author Affiliations
  • 1Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2College of Materials Science and Optoelectronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China
  • show less

    Extreme ultraviolet (EUV) multilayer are crucial components of EUV lithography optical systems. During the operation of lithography systems, the performance of EUV multilayer mirrors can be affected significantly by surface contaminants, thus resulting in reduced light-source output power and decreased overall system lifespan. Understanding the contamination of EUV multilayer mirrors and developing targeted control technologies can enhance the stability and longevity of EUV lithography systems. This paper reviews the research progress on the contamination control of EUV multilayer mirrors, with emphasis on the causes of surface contamination and cleaning technologies. It provides a detailed overview of the main contaminants and formation mechanisms of multilayer mirrors in EUV lithography systems, as well as prevention, suppression, and cleaning techniques for different contamination types.

    Keywords
    Tools

    Get Citation

    Copy Citation Text

    Kai Huang, Tingting Zeng, Jianda Shao, Meiping Zhu. Research Progress on Surface Contamination and Cleaning Techniques of Extreme Ultraviolet Multilayer Coatings[J]. Laser & Optoelectronics Progress, 2025, 62(1): 0100001

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Reviews

    Received: Oct. 14, 2024

    Accepted: Nov. 15, 2024

    Published Online: Jan. 9, 2025

    The Author Email:

    DOI:10.3788/LOP242093

    Topics