The influence of substrate temperature on microstructure, electrical and optical properties of in situtextured zinc oxide (ZnO) films fabricated by metal organic chemical vapor deposition (MOVCD) had been investigated. Results indicated that the substrate temperature played a very important role on preparation of ZnO thin film. With the raising of temperature, firstly ZnO crystals were perpendicular to the substrate, then they were grown inclining toward the substrate, finally ZnO crystals grown in layers but not regular. Consequently, ZnO film surface morphology changed from smooth to a pyramid structure and then disappeared little by little. Moreover, it was also found in this study that ZnO film was characterized with high crystallinity, low resistivity (2.17×10-2) and high transmittance (>80%). These results suggested that ZnO thin film is suitable for front electrode of silicon thin film solar cell.