Study on KrCl and XeCl double laser oscillation

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Chinese Journal of Lasers, Volume. 12, Issue 9, 521(1985)

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

Author Affiliations

[in Chinese]

show less

Abstract Get PDF(in Chinese)

A double wavelength laser which oscillates at 308 nm(XeCl) and 222 nm (KrCl) has been achieved from a mixture of Kr/Xe/HCl/He. KrCl lasing action appeared earlier than that of XeCl by 12 ns. The Xe partial pressure in the mixture was very critical for the double wavelength oscillation.

Tools

Get Citation

Copy Citation Text

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on KrCl and XeCl double laser oscillation[J]. Chinese Journal of Lasers, 1985, 12(9): 521

Download Citation

EndNote(RIS)BibTex Plain Text

Set citation alerts for article

Save article for my favorites

Paper Information

Category: laser devices and laser physics

Received: Sep. 12, 1984

Accepted: --

Published Online: Nov. 6, 2012

The Author Email:

DOI:

CSTR:32186.14.

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology