Chinese Journal of Lasers, Volume. 29, Issue 1, 40(2002)

Study on Metastable Neon Beam Source Used for Atom Lithography

[in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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    A neon metastable beam source was built up, from which Neon metastable beam of the intensity of 3.3×10 14 atoms/s·Sr. was generated. The characteristics of the metastable Neon beam were studied, and the corresponding mechanisms are discussed.

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on Metastable Neon Beam Source Used for Atom Lithography[J]. Chinese Journal of Lasers, 2002, 29(1): 40

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    Paper Information

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    Received: Nov. 23, 2000

    Accepted: --

    Published Online: Aug. 8, 2006

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