Study of the Dual Oscillation of XeBr and XeCl Laser

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Chinese Journal of Lasers, Volume. 21, Issue 4, 253(1994)

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

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A bi-wavelength laser oscillation at 282 nm and 308 nm in a mixture of HCl/HBr/Xe/Ne is reported. The process of the dual oscillation have been analyzied. A investigation is also made about the density influence on HCl on the energy and lifetime of XeBr laseras well as HBr on XeCl laser's.

Keywords

XeBr XeCl dual oscillation

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study of the Dual Oscillation of XeBr and XeCl Laser[J]. Chinese Journal of Lasers, 1994, 21(4): 253

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Paper Information

Category: Laser physics

Received: Jun. 15, 1993

Accepted: --

Published Online: Aug. 17, 2007

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DOI:

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology