Chinese Journal of Lasers, Volume. 33, Issue 6, 837(2006)
Laser-Induced Damage of Flat Polarizer Prepared by Electron Beam Evaporation
The flat polarizer was prepared by electron beam evaporation and its optical performance was measured by Lambda900 spectrometer. The transmission of P-polarization is more than 98%, the transmission of S-polarization is less than 0.5%, its extinction ratio is more than 200:1, and its spectral bandwidth is 20 nm near 1053 nm. The laser-induced damage thresholds (LIDTs) of P-polarization and S-polarization are 17.2 J/cm2 and 19.6 J/ cm2, respectively, measured at 1064 nm wavelength,12-ns pulse width and the incident angle of 60°. The morphology of the laser-induced damage was characterized by Nomarski microscopy and its depth was measured by Alpha-500 step meter. Two distinct damage morphologies (defect and delamination) were observed when polarizer was tested in P-polarization. The character of interface caused the outer layer delamination damage morphology and which happened at hafnia-silica interface of the outer layer. The defect damage was induced by the defects in the film, and it appeared in the interior of the polarizer. In the case of S-polarization,the outer layer delamination damage morphology,which was induced by standing electric field was also observed.
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Laser-Induced Damage of Flat Polarizer Prepared by Electron Beam Evaporation[J]. Chinese Journal of Lasers, 2006, 33(6): 837