Cu/Zr nano-multilayer films are prepared by Direct Current(DC) magnetron sputtering in the silex substrate,and the box-type furnace is used to anneal.Micro-sclerometer,X-ray Diffractometer(XRD) and Scanning Probe Microscope(SPM) are used to analyze the mechanical performance and microstructure of Cu/Zr nano-multilayer films.The relation of process parameters and performance is investigated.Results show that:When Cu modulation thickness varies between 42 nm and 140 nm,the microhardness of Cu/Zr nano-multilayer films gradually reduces from 4.9 GPa to 4.0 GPa;When Zr modulation thickness is from 3.2 nm to 4.8 nm,the hardness decreases from 6.51 GPa to 5.64 GPa,hardness value decreases 13.4%,then Zr modulation thickness is from 4.8nm to 8nm,and microhardness tends a steady value(about 5.7 GPa);When annealed suitably,the superficial appearance and microhardness of Cu/Zr nano-multilayer films get better.The results accord with the model of hardness enhancement which is proposed by X Chu and S A Barnett.