Semiconductor Optoelectronics, Volume. 46, Issue 4, 645(2025)

Impact of High-Reflectivity Films in Dead Zones on the Quantum Efficiency of Silicon Photomultipliers

GUO Chaoqian1, WANG Jun1,2, WU Yun3, YANG Yanfei1,2,4, ZHANG Xiangtong1, ZHANG Haotong1, WANG Lei1, LIU Lu1,4,5, LIU Lina5, LI Lianbi1,2,4, HAN Xiaoxiang1,2,4, LI Zebin1,2,4, and ZHANG Guoqing1,2,4
Author Affiliations
  • 1School of Science, Xi'an Polytechnic University, Xi'an 710048, CHN
  • 2School of Science, Xi'an University of Technology, Xi'an 710048, CHN
  • 3Beijing Institute of Control Engineering, Beijing 100190, CHN
  • 4Shaanxi Provincial Engineering Research Center for Radiation Flexible Protection Technology, Xi'an 710048, CHN
  • 5Key Laboratory of Nuclear Protection Textile Equipment Technology, Xi'an 710048, CHN
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    This study proposes a method that involves depositing a highly reflective metal film on the dead-zone surface of the SiPM. This structure forms an optical resonant cavity with the transparent encapsulation layer, redirecting incident light from the dead zones to the photosensitive regions, thereby enhancing both the PDE and absolute quantum efficiency. The mechanism behind this enhancement was analyzed using geometric optics modeling in combination with simulations performed in Comsol Multiphysics. Theoretical calculations and optical simulations reveal an increase in light transmittance of 6.23% and 6.31%, respectively. Additionally, semiconductor device simulations demonstrate a 6.2% improvement in absolute quantum efficiency, aligning closely with the simulated transmittance gains. This approach effectively mitigates losses due to the dead zones, offering a viable solution for enhancing the photon detection capabilities of SiPMs.

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    GUO Chaoqian, WANG Jun, WU Yun, YANG Yanfei, ZHANG Xiangtong, ZHANG Haotong, WANG Lei, LIU Lu, LIU Lina, LI Lianbi, HAN Xiaoxiang, LI Zebin, ZHANG Guoqing. Impact of High-Reflectivity Films in Dead Zones on the Quantum Efficiency of Silicon Photomultipliers[J]. Semiconductor Optoelectronics, 2025, 46(4): 645

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    Paper Information

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    Received: Apr. 22, 2025

    Accepted: Sep. 18, 2025

    Published Online: Sep. 18, 2025

    The Author Email:

    DOI:10.16818/j.issn1001-5868.20250422001

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