Chinese Journal of Lasers, Volume. 36, Issue 11, 3050(2009)

Laser Damage of Optical Film with the Combined Irradiation of 1064 nm and 532 nm Pulse

Zhou Ming1,2、*, Zhao Yuan′an1, Li Dawei1, Fan Zhengxiu1, and Shao Jianda1
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  • 1[in Chinese]
  • 2[in Chinese]
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    A testing device of laser-induced damage threshold (LIDT) with the combined irradiation of different wavelength pulse was built. The damage morphology and the laser-induced damage threshold of 1064 nm and 532 nm anti-reflection film (ARF) were researched by 1064 nm pulse only,532 nm pulse only and 1064 nm with 532 nm pulse combined irradiation. The result showed that the damage morphology of samples caused by 1064 nm and 532 nm pulse combined irradiation was similar with which of the 532 nm pulse,and the 532 nm pulse plays a leading role in the factors that induce damage. The LIDT of 1064 nm pulse is higher than one of 532 nm pulse,that of 1064 nm and 532 nm pulse combined irradiation is in the range between 1064 nm pulse only and 532 nm pulse only.

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    Zhou Ming, Zhao Yuan′an, Li Dawei, Fan Zhengxiu, Shao Jianda. Laser Damage of Optical Film with the Combined Irradiation of 1064 nm and 532 nm Pulse[J]. Chinese Journal of Lasers, 2009, 36(11): 3050

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    Paper Information

    Category: materials and thin films

    Received: Nov. 3, 2008

    Accepted: --

    Published Online: Nov. 11, 2009

    The Author Email: Ming Zhou (zhouming08@siom.ac.cn)

    DOI:10.3788/cjl20093611.3050

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