Chinese Journal of Lasers, Volume. 23, Issue 9, 801(1996)
The Roughness of the Very Thin Si Films
The surface roughness of the very thin Si films deposited on the K9 glass and thesilicon wafer using planar magnetron sputtering has ben measured by ZYGO and scatteringmethods. A saturated value of the roughness of the very thin Si films on the K9 glass isillustrated.
Keywords
Tools
Get Citation
Copy Citation Text
[in Chinese], [in Chinese], [in Chinese], [in Chinese]. The Roughness of the Very Thin Si Films[J]. Chinese Journal of Lasers, 1996, 23(9): 801
Paper Information
© Copyright 2018-2021 | Chinese Laser Press.
All Rights Reserved 沪ICP备15018463号-20