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Chinese Journal of Lasers, Volume. 17, Issue s1, 162(1990)

Measurement of absorption distribution on optical thin film by scanning photothermal microscopy

Huang Xuebo and Chen Wenbin
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    A scanning photothermal microscopy based on photothermal deflection spectroscopy is used to measure the absorption distribution of laser damaged films. Its detecting sensitivity and detecting accuracy is 2.5×10-6 and 18% respectively.

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    absorption distributionoptical thin filmphotothermal microscopy
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    Huang Xuebo, Chen Wenbin. Measurement of absorption distribution on optical thin film by scanning photothermal microscopy[J]. Chinese Journal of Lasers, 1990, 17(s1): 162

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    Paper Information

    Category: materials and thin films

    Received: Sep. 10, 1989

    Accepted: --

    Published Online: Oct. 12, 2012

    The Author Email:

    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology