Chinese Optics Letters, Volume. 3, Issue 11, 11676(2005)

Investigation on the properties of high reflective mirror prepared by ion-beam sputtering

Jianbing Huang1,2, Guanglei Tian1,2, Jianda Shao1, and Zhengxiu Fan1
Author Affiliations
  • 1R&
  • 2Center for Optical Thin Film Coatings, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800
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    The single-sided and dual-sided high reflective mirrors were deposited with ion-beam sputtering (IBS). When the incident light entered with 45 degrees, the reflectance of p-polarized light at 1064 nm exceeded 99.5%. Spectrum was gained by spectrometer and weak absorption of coatings was measured by surface thermal lensing (STL) technique. Laser-induced damage threshold (LIDT) was determined and the damage morphology was observed with Lecia-DMRXE microscope simultaneously. The profile of coatings was measured with Mark III-GPI digital interferometer. It was found that the reflectivity of mirror exceeded 99.9% and its absorption was as low as 14 ppm. The reflective bandwidth of the dual-sided sample was about 43 nm wider than that of single-sided sample, and its LIDT was as high as 28 J/cm2, which was 5 J/cm2 higher than that of single-sided sample. Moreover, the profile of dual-sided sample was better than that of substrate without coatings.

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    Jianbing Huang, Guanglei Tian, Jianda Shao, Zhengxiu Fan, "Investigation on the properties of high reflective mirror prepared by ion-beam sputtering," Chin. Opt. Lett. 3, 11676 (2005)

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    Paper Information

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    Received: Jan. 18, 2005

    Accepted: --

    Published Online: Jun. 6, 2006

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