Chinese Journal of Lasers, Volume. 20, Issue 9, 663(1993)
A technology of plasma etched diffractive optical elements
The paper investigates the technology to etch photoresist diffractive optical elements with sinuous grooves into its base layer, emphasizing upon the analysis of the relationship between both groove profiles and depthes of the base layer and the photoresist layer based on experiments.
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[in Chinese], [in Chinese], [in Chinese]. A technology of plasma etched diffractive optical elements[J]. Chinese Journal of Lasers, 1993, 20(9): 663
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