[in Chinese]; [in Chinese]; [in Chinese]

Chinese Journal of Lasers, Volume. 12, Issue 6, 374(1985)

[in Chinese]

[in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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The deposition of W film by means of photolysis of vapor W(CO)6 with a 257.3 nm UV laser is presented. The dependence of the deposition rate on the light intensity, cell temperature and buffer gas pressure are investigated and the relationship between the photolysis deposition rate of W(CO)6 and the intensity of deposition light has been observed.

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[in Chinese], [in Chinese], [in Chinese]. [J]. Chinese Journal of Lasers, 1985, 12(6): 374

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