1School of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou 510006, China
2Guangdong Provincial Key Laboratory of Sensing Physics and System Integration Applications, Guangdong University of Technology, Guangzhou 510006, China
2D-material-based photodetectors enhanced by plasmonic nanostructures can support responsivity/detectivity several orders higher than commercial photodetectors, drawing extensive attention as promising candidates for the next-generation photodetectors. However, to boost the nanostructure-enhanced 2D photodetectors into real-world applications, crucial challenges lie in the design of broadband enhancing nanostructures and their scalable and position-controllable fabrication. Here, based on a broadband resonant plasmonic disk array fabricated by a scalable and position-controllable technique (direct writing photolithography), we present a visible-near infrared (405–1310 nm) 2D photodetector, whose detectivity is up to Jones, a value exceeding that of the previous plasmon-enhanced 2D photodetectors. The broadened spectral response range and the high detectivity originate from the hot electron injection, optical absorption enhancement, and strain effect supported by the plasmonic array. Furthermore, the designed plasmonic 2D photodetector supports self-powered photodetection, indicating promising potential in energy-free and portable optoelectronic systems. Our results demonstrate an effective method to construct high-performance broadband photodetectors, which can facilitate the development of 2D photodetectors in commercial applications.
【AIGC One Sentence Reading】:A broadband plasmonic disk array boosts 2D WS2 photodetector performance, achieving high detectivity and self-powered operation.
【AIGC Short Abstract】:A visible-near infrared broadband photodetector using 2D WS2 enhanced by a plasmonic disk array fabricated via direct writing photolithography is presented. It achieves high detectivity and self-powered photodetection, showcasing potential for energy-free, portable optoelectronic systems and advancing 2D photodetector technology for commercial use.
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1. INTRODUCTION
Photodetectors have wide applications in optical communications, imaging, sensing, and integrated photonics due to their ability to convert optical signals to electrical signals [1–6]. In the development of next-generation photodetectors, two-dimensional (2D)-material-based photodetectors have been playing a pivotal role by taking advantages of 2D materials in band tunability, integration flexibility, device fabrication, etc. [7–10]. The performance of 2D-material photodetectors however is largely restricted by their poor light absorption [7,11] and the limited spectral response range constrained by the intrinsic band structures [12]. In order to improve the performance of 2D-material photodetectors, various strategies have been explored, such as heterostructure construction [13–16], material doping [17], interface engineering [18], and photonic-nanostructure-induced enhancement [19–21]. Among these strategies, photonic-nanostructure-induced enhancement has attracted extensive interests because of its significant improvements in photodetection performance, flexible degree of freedom in design, and compatibility of cooperation with other enhancing strategies [22,23].
In a nanostructure-enhanced 2D photodetector, photonic nanostructures supporting optical resonant modes can concentrate light around the nearby 2D materials, enhancing its absorption and hence improving the performance of photodetectors [24]. To date, a variety of nanostructures, including plasmonic nanostructures [25–27], Mie resonators [28,29], and optical microcavities [30,31], have been reported and proven to be effective in achieving high-performance 2D photodetectors. Particularly, plasmonic nanostructures can bring about further improvement by an additional mechanism, hot electron injection [32–34], which not only enhances detectivities and responsivities of 2D photodetectors, but also shows potential in expanding their response spectral range [35]. However, most of the previous nanostructures used in 2D photodetectors only support narrowband resonances, restricting their validation in the development of highly desired broadband photodetectors [35].
On the other hand, from the viewpoint of applications, the fabrication and integration of nanostructures in the photodetectors need to be scalable and site-controllable. When it comes to this case, fabrication processes involving electron beam lithography or focused ion beams can produce photonic nanostructures with precise control of positions, but are expensive and limited in large-area device fabrication [36–38]. On the contrary, the used scalable fabrication techniques, such as thermal dewetting [39], AAO templating [40], vapor deposition [41], liquid phase synthesis [42], colloidal particles [43], and nanosphere lithography [44,45], can generate large-scale nanostructures with low cost, but are deficient in the capability of position controlling. Therefore, it is highly desired to develop scalable and site-controllable nanostructures in the developing of high-performance 2D photodetectors.
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Here, we propose an enhanced broadband 2D photodetector enabled by a plasmonic array, which is fabricated by direct writing photolithography, a scalable technique with on-demand control of positions. The broadband enhancements are realized by the cooperation of three mechanisms, including hot electron injection, optical absorption enhancement, and strain effect. By taking advantages of these mechanisms, distinctly improved performance of a -based 2D photodetector is demonstrated, with a broadened spectral response range from 405 to 1310 nm, an excellent detectivity up to Jones, and a high responsivity of 242 A/W. In addition, self-powered photodetection is also supported by the presented plasmonic 2D photodetector, which is highly desired in power-saving and portable optoelectronic devices. Our work demonstrates a scalable method for constructing high-performance broadband 2D photodetectors, which has great potential for boosting the applications of 2D photodetectors in imaging, broadband sensing, and optoelectronic systems.
2. RESULTS AND DISCUSSION
From the optical and optoelectronic point of view, optical field enhancement and plasmonic hot electron injection hold the key to improving performance of the constructed 2D photodetector. As schemed in Fig. 1(a), on one hand, enhanced local light fields can improve optical absorption of the 2D materials, increasing the carriers directly generated in the materials [Fig. 1(a), I and II]. On the other hand, localized surface plasmons (LSPs) interact strongly with photons and utilize light energy to generate high-energy hot electrons that consequently transfer to the nearby 2D materials [Fig. 1(a), III], contributing to the enhancement of photocurrent. Therefore, in order to improve the performance of 2D photodetectors throughout a broad spectral range, it is important to develop plasmonic nanostructures with broadband resonances.
Figure 1.(a) Working principle of plasmon-enhanced photodetector. There are three primary processes responsible for the eventual migration of electrons to the conduction band of a semiconductor, including I, II, III. (b) Experimental and simulated reflection and transmission spectra of gold disk arrays with a diameter of 1.5 μm, a period of 2.5 μm, and a thickness of 40 nm. (c) Absorption spectra of pristine (black line), gold disk arrays (yellow line), (on the gold disk array) (blue line), and the assembly of and underlying Au disk array (red line). The blue line represents the absorption of the sheet that is on the gold disk array, while the red line represents that of the assembly of the sheet and the gold disk array under it. (d) Electric field distributions of interface between and gold disks at the wavelengths of 405 nm, 532 nm, 635 nm, 808 nm, 1060 nm, and 1310 nm. The minimum and maximum values in the color bar represent the minimum and maximum values of the respective electric fields at each wavelength.
To this end, a plasmonic disk array with broadband enhancements is constructed, as shown by Figs. 1(b)–1(d). The plasmonic disk array exhibits no narrowband resonance from visible to near infrared bands except for the interband transition of gold around 500 nm [Fig. 1(b)]. Nevertheless, such a disk array possesses the capabilities to distinctly increase the optical absorption of nearby 2D materials in the short-wavelength range [Fig. 1(c)] and support electric field enhancements throughout visible to near infrared bands [Figs. 1(d) and 6 (Appendix E)]. The electric field distributions exhibit similar characteristics, including strong fields at vicinities of disk edges, which is typical for localized surface plasmons (LSPs), ring-shaped areas of enhanced field outside the disks, and standing wave patterns of breathing modes on the disk surface, which are more notable for the short-wavelength band. The latter two patterns are not haunted by the high optical loss of LSPs, making them more beneficial to the absorption enhancement of nearby 2D materials. With increased optical absorption, more carriers will be generated inside the 2D materials, benefiting the performance of 2D photodetectors. As for the wavelengths without obvious absorption enhancement, hot electron injection stemming from LSPs can also increase the carriers in the nearby 2D materials and thus improve device performance.
Experimentally, the designed plasmonic disk array needs to be integrated into a 2D photodetector, which can be accomplished in a facile and scalable way, as shown in Fig. 2(a). In particular, the as-proposed broadband 2D photodetector consists of an layer of on an h-BN-covered plasmonic disk array, with a pair of gold electrodes [Fig. 2(a)]. First, an array pattern is formed in a photoresist by standard direct writing photolithography, and the plasmonic disk array is then obtained by electron beam evaporation and a lift-off procedure [Fig. 2(a), I]. Next, a monolayer h-BN is wet transferred onto the gold disk array to avoid direct contact of plasmonic nanostructures and 2D materials [Fig. 2(a), II] [46]. Subsequently, a few-layer nanosheet is dry transferred onto the h-BN-coated disk array and made to form a conformal shape with underlying structures by a thermal treatment of 90°C for 5 min [Fig. 2(a), III and IV]. Afterward, a pair of gold electrodes is added on opposite sides of the sheet by photolithography and deposition, forming a 2D photodetector [Fig. 2(a), V]. Using these procedures, the plasmonic 2D photodetector with a simple electrical structure can be fabricated facilely, containing only two electrodes without involving a third gate electrode. The stability of the used 2D materials regarding the thermal treatment is verified by Raman spectra measurements (Fig. 7 in Appendix E).
Figure 2.(a) Schematic diagram of the fabrication processes of the plasmonic 2D photodetector with five parts: (I) the prefabrication of plasmonic disk array, using direct writing photolithography for patterning and electron beam evaporation for gold deposition, (II) wet transfer of a monolayer h-BN, (III) dry transfer of a few-layer nanosheet, (IV) a thermal treatment of 90°C for 5 min, and (V) the fabrication of electrodes. (b) An optical micrograph of the fabricated plasmonic 2D photodetector. The white dashed line indicates the position of , and the yellow dashed line portrays gold electrodes while the blue circle represents the position of the underlying plasmonic disks. The sheet is about 30 nm in thickness. (c) AFM morphology of the plasmonic disk array with a thickness of about 40 nm. (d) AFM 3D image of on the plasmonic disk array.
As a demonstration, we fabricated an as-described broadband 2D photodetector, as shown by the optical photograph in Fig. 2(b). Within the photodetector, the plasmonic disk array was designed with geometrical parameters of , , and , with well-defined morphology shown by the atomic force microscopy (AFM) image in Fig. 2(c). To fully take advantages of the plasmonic disk array, close contact is beneficial between the sheet and the disk array, which can be achieved by the thermal treatment mentioned above. After the thermal treatment, the sheet appeared to be flat on the plasmonic disks, and curved and closer to the substrate at other locations, proving fine contact between the 2D materials and the underlying plasmonic disks [Fig. 2(d)]. In Fig. 2(d), the disk areas with 2D materials were distinctly higher than those without covering, which is because the used sheet was about 30 nm in thickness. More information regarding the morphology of the fabricated device can be found in Fig. 8 (Appendix E).
In an as-fabricated device, the close vicinity of and the disk array can enable strong interactions between them both optically and electronically, making it effective to benefit from the light field enhancement and hot electron injection aroused by the plasmonic disks. As a consequence of their interactions, the photoluminescence (PL) of the on the plasmonic disk array was enhanced to 2.82 times of intensity under excitation of a 532 nm laser, compared to that of a pristine [Fig. 3(a)]. In addition, the spatial distribution of the PL intensities of the device was obviously modulated by the plasmonic disks, showing the strongest intensities around the disk edge [Fig. 3(b)], which is in accordance with the electric field distributions of the plasmonic disks shown in Fig. 1.
Figure 3.(a) PL spectra of the photodetectors with and without plasmonic disks under 532 nm laser excitation, revealing a difference of 23 nm in peak wavelengths. (b) Spatial distribution of the PL intensities of on plasmonic disks under 532 nm laser excitation. (c) characteristic curves of the photodetectors with (red curves) and without (black curves) plasmonic disks at a variety of intensities ranging from 0 to under 635 nm illumination. (d) Responsivity of the photodetectors with and without plasmonic disks as a function of light power intensity at a bias voltage of 1 V under 635 nm illumination. (e) Detectivity of the photodetectors with and without plasmonic disks as a function of light power intensity at a bias voltage of 1 V under 635 nm illumination. (f) Comparison between the responsivity and detectivity of our work and the existing 2D photodetectors working with plasmonic nanostructures.
When it comes to the optoelectronic aspect, the interactions with the plasmonic disks bring about distinctly improved performance of the 2D photodetector. As shown in Fig. 3(c), the photocurrents of with plasmonic disks [red curves in Fig. 3(c)] were obviously larger than that without plasmonic disks [black curves in Fig. 3(c)] under illumination of a 635 nm laser with varied power densities. To be quantitative, there was a maximum amplification of 49 times in responsivity with the assistance of the plasmonic disks, as illustrated by Fig. 3(d) plotting the responsivity of the photodetectors with (red curve) and without (black curve) plasmonic disks illuminated using a 635 nm laser with varied power densities. The responsivity of the plasmonic 2D photodetector decreased obviously as incident light power densities increased [Figs. 3(d) and 9 (Appendix E)], which was caused by the saturation effect of carriers [47].
In the assessment of a photodetector, detectivity is another crucial parameter, which represents the capability of detecting weak light signals. Hence, the detectivity of the studied photodetectors under 635 nm illumination was also measured and shown in Fig. 3(e). In this case, the detectivity was able to be enhanced by 47 times in the presence of the plasmonic disks, as shown by the detectivity data of the 2D photodetectors with [red curve in Fig. 3(e)] and without [black curve in Fig. 3(e)] the plasmonic disks. As for the dependence of detectivity on power density, it was similar to that of responsivity, where decreases appeared as incident power densities increased [Figs. 3(e) and 10 (Appendix E)].
In fact, the constructed plasmonic 2D photodetector possessed high performance throughout a broad spectral range from visible to near infrared bands (Figs. 9–12 in Appendix E). Particularly, at its best working wavelength (405 nm), the plasmonic 2D photodetector supported a remarkably large detectivity up to Jones and a high responsivity of 242 A/W (Figs. 9 and 10 in Appendix E). Figure 3(f) depicts the detectivity and responsivity of the typical 2D photodetectors working with plasmonic nanostructures in previous reports [12,19–21,48–56], showing that our plasmonic 2D photodetector outruns the existing counterparts in detectivity while maintaining a relatively high responsivity. When compared with the existing -based 2D photodetectors, the overall performance of our plasmonic 2D photodetector also holds significant advantages, the details of which can be found in Table 1 (Appendix E).
Performance Comparison of the Plasmon-Coupled WS2 Photodetector with Other Reported WS2-Based Photodetectorsa
Material
Peak Responsivity (A/W)
Peak Detectivity (Jones)
Detection Range (nm)
(s)
(s)
Reference
5.5
400–1030
[48]
0.87
N/A
0.1
[73]
1050
N/A
590–850
0.1
0.2
[74]
Oxygen-doped
1.5
450–2000
[75]
2.09
400–1000
0.13
0.22
[76]
35.4
N/A
[77]
365–1000
[78]
N/A
N/A
N/A
[79]
lL NCs
N/A
457–1064
[80]
298
405–635
[81]
2.7
365–623
[82]
950
N/A
340–680
N/A
N/A
[83]
QDs
3364
N/A
30
80
[84]
-ND/AgNP-metafilm
11.7
400–700
0.3
1
[85]
300
N/A
[86]
1200
N/A
360–1064
[87]
214
300–1100
[88]
Graphite/ZnO–
1.8
390–1080
14.27
52.63
[89]
0.52
365–660
[90]
0.226
N/A
[91]
54.5
450–1050
[92]
89,600
400–1800
[93]
Si
0.29
265–3000
[94]
30
N/A
[95]
0.6345
200–4600
[71]
bilayer
2340
N/A
N/A
N/A
[96]
0.42
370–1064
[97]
Lateral bilayer
6720
457–671
[98]
223.5
405–808
[99]
251,000
405–655
[100]
402
405–808
[101]
p-PbS
57.6
530–1550
N/A
N/A
[102]
0.061
325–980
[103]
17
470–627
[104]
3.72
N/A
[105]
N/A
[106]
1.51
N/A
[107]
1090
N/A
6.98
10.73
[108]
1.1
N/A
N/A
N/A
[109]
Lateral bilayer
10,600
N/A
[110]
Multilayer
N/A
457–647
[111]
Multilayer
0.7 (vacuum)
370–1064
9.9
8.7
[112]
Multilayer
53.3
N/A
N/A
N/A
[113]
disks
242
405–1310
This work
Ref, reference; Gr, graphene; N/A, no data.
To comprehensively investigate the broadband detecting capability, the photocurrent behavior and temporal response of the plasmonic 2D photodetector were measured. As shown by the current-voltage () characteristics in Fig. 4(a), with the involvement of the plasmonic disks, notable amplifications of photocurrents can be observed throughout a broad wavelength range from 405 nm to 1060 nm. In the measurements, higher light intensities were employed in the near infrared region, which can be attributed to the lower yield of photogenerated electrons in the NIR band, given the inherent limitation of in terms of its bandgap. More detailed data are given by Figs. 3(c), 4(b), and 11 (Appendix E). Accordingly, the responsivity and detectivity of the plasmonic 2D photodetector were also magnified in a wide spectral band (Fig. 11).
Figure 4.(a) characteristics of the photodetectors with and without plasmonic disks in the dark and at a fixed light intensity under 405–1060 nm illumination. The dashed line represents the dark current of the two devices, while the solid line represents the photocurrents at a fixed light intensity. (b) curves of the photodetectors with plasmonic disks under 1060 nm illumination with light intensity from 0 to . (c) Reproducible on−off switching under 808 nm illumination (with a light intensity of ) at zero bias. (d) Normalized transient response of the photodetectors with and without plasmonic disks at a bias voltage of 1 V under 405–1310 nm illumination. (e) An enlarged transient photoresponse cycle at a bias voltage of 1 V under 635 nm excitation with intensity.
In addition, the plasmonic 2D photodetector can support self-powered photodetection [12,57] without bias voltage, i.e., , especially in the cases of longer wavelengths [Figs. 4(a) and 4(b)]. To further verify the self-powered effect, a current-time measurement without bias voltage was carried out under periodic laser pulse incidence. As shown in Fig. 4(c), the photocurrent rose when the laser pulse turned on, and fell as the pulse turned off, verifying the capability of self-powered photodetection. The demonstrated self-powered photodetection with enhanced photocurrent indicates low energy consumption and high responsivity, and is highly desired for the next-generation photodetectors.
In the experiments, self-powered photodetections were notable for light incidence with wavelengths of 808 nm and longer, but not obvious for that of 635 nm and shorter [Fig. 4(a)]. The reason for this may be the difference in the dominant channel of carrier generation. According to the theoretical results in Fig. 1(c), the optical absorption of is enhanced by the presence of the plasmonic disks in the short-wavelength band, contributing to the generation of more electron–hole pairs in the 2D materials. On the contrary, for wavelengths longer than 700 nm, there is no noticeable enhancement in the optical absorption of , indicating that in the long-wavelength band the photocurrent enhancements mainly stem from the electrons transferred from the plasmonic disks. Because of the lack of a bonding effect of electron–hole pairs, plasmonic hot electrons possess ultrafast diffusion behavior [58]. The hot electrons may diffuse quickly to all directions after they are injected into the . Since the contact lengths between the and the two electrodes are different [Fig. 2(b)], different quantities of electrons will be accumulated at the two electrodes. This will cause an electric potential difference that can enable notable photocurrent without external bias voltage. To further confirm the origin of the self-powered photodetection, a pump-probe technique with ability to measure temporal and spatial signals may be used to observe the transient evolution of the plasmonic hot electrons [58].
The biased time-dependent response of the plasmonic 2D photodetector under different incident wavelengths was measured and is shown in Fig. 4(d). The photocurrent of the device rose immediately and then stayed balanced after the laser turned on, and decayed fast when the laser turned off [Fig. 4(d)]. For instance, when working at 635 nm, the temporal response of the plasmonic 2D photodetector was quite fast, with a rise/fall time of 11/17 ms [Fig. 4(e)]. More discussions on the temporal performance and stability of the plasmonic 2D photodetector can be found in Figs. 13 and 14 (Appendix E).
It is worth noting that, for incident light at wavelengths longer than 1060 nm, photocurrents were only observed in the plasmonic 2D photodetector [the two upper colored curves in Fig. 4(d)], while no observable photoresponse appeared in the case of pristine [black curves in Fig. 4(d)]. This means that the photoresponse for wavelengths longer than 1060 nm is caused by the involvement of the plasmonic disks. Furthermore, the temporal measurements verify that the detection of 1310 nm light signal is also supported by the plasmonic 2D photodetector [the top sub-figure of Fig. 4(d)]. Therefore, the demonstrated photodetector can work throughout a distinctly broadened spectral response range from 405 to 1310 nm, which is rare but highly desired for 2D photodetectors.
The hot electron transfer from the plasmonic disks is the main cause bringing about such a distinct broadening effect of the response band. Apart from this cause, the strain effect plays an auxiliary role in the spectral broadening, as investigated in some previous works [12,59]. To be specific, the bandgap of is narrowed when a tensile strain is enforced on it, and the narrower bandgap arouses a response to smaller photon energy and longer wavelength. Figures 5(a)–5(c) and 15 (Appendix E) calculate the theoretical results of such a stain effect, showing that the bandgap of is narrowed by applying a strain [Fig. 5(b)] and becomes narrower as the applied strain increases [Figs. 5(c) and 15]. In experiment, the height differences of in Fig. 2(d) indicate the existence of tensile strain, and the redshift of PL peak wavelength in Fig. 3(a) (marked by the dashed lines) reflects the bandgap narrowing of the on plasmonic disks [60]. In the measurement of Raman scattering, the peak of on plasmonic disks had a redshift of when compared with that of a pristine , which is corresponding to a 0.3% strain according to previous studies [12]. Such a strain can cause a theoretical bandgap narrowing of 40 meV in (Fig. 15), indicating photoresponse to longer wavelengths. It should be noted that in a real case the strain is not spatially uniform but correlated with the morphology pattern of the Au disk, which can be indicated by the spatial distribution of the relative Raman shift (Fig. 16 in Appendix E).
Figure 5.(a) Top and side views of . (b) Band structure of with 0.3% strain and without applied strain. (c) Connection among the conduction band (yellow line), valence band (blue line), and Fermi level (red line) of and tensile strain. (d) Raman spectra of the photodetectors with and without plasmonic disks under 532 nm laser excitation.
In summary, we proposed a scalable method to construct a high-performance broadband 2D photodetector based on a plasmonic disk array. Hot electron injection and optical absorption enhancement aroused by plasmonic disk arrays played important roles in improving the performance of the 2D photodetector. The tight contact between the 2D material and the plasmonic disk array caused a strain effect that, together with hot electron injection, broadened the spectral response range of the 2D materials. Under the cooperations of these effects, a -based 2D photodetector exhibited distinctly improved performance with a broadened spectral response range from 405 to 1310 nm, an excellent detectivity up to Jones, and a high responsivity of 242 A/W. Besides, self-powered photodetection can be supported by the presented plasmonic 2D photodetector, which is attractive for power-saving and portable systems. In addition, the plasmonic disk array was fabricated by direct writing photolithography, a scalable technique with on-demand control of positions, which made it promising for real-world industrial manufacturing and applications. In future studies, the demonstrated scalable approach of building broadband 2D photodetectors may cooperate with other improving methods, such as heterostructure construction and material doping, to construct 2D photodetectors with unprecedentedly excellent performance, bringing about promising advantages in related optoelectronic devices and systems.
Acknowledgment
Acknowledgment. The authors thank the Center of Campus Network & Modern Educational Technology, Guangdong University of Technology, Guangdong, China, for providing computational resources and technical support for this work. The authors also thank the Analysis and Test Centre of Guangdong University of Technology for providing characterization instruments, including the confocal Raman spectrometer (Horiba, LabRAM HR Evolution) and scanning electron microscope (Tescan, LYRA 3 XMU).
APPENDIX A: DETAILS OF THE DEVICE FABRICATION
Before device fabrication, we washed the quartz substrate in acetone, ethanol, and deionized water for 5 min, dried it with a nitrogen gun, and baked it on a hot plate at 150°C for 2 min. Next, ARP5350 photoresist on the clean substrate was spin-coated at a speed of 4000 r/min for 60 s and baked at 105°C (4 min) and then yielded the pattern of a periodic disk array. Subsequently, titanium and gold with thicknesses of 1 nm and 40 nm were deposited, respectively, and the lift-off process was carried out by soaking in acetone to remove the photoresist and unwanted gold film. After that, the single-layer h-BN was placed above the disk array using the PMMA wet transfer method. Then, the few-layer was exfoliated from bulk (Shanghai OnWay Technology Co., Ltd.) and transferred on top of the h-BN flake with polydimethylsiloxane (PDMS) and heated at 90°C for 5 min, resulting in close contact between the and the underlying layers. Finally, S/D electrodes (10/50 nm Ti/Au) were patterned and deposited on the substrate using the preparation method of the previous periodic gold disk array.
APPENDIX B: DETAILS OF CHARACTERIZATIONS AND MEASUREMENTS
Optical microscopy and scanning electron microscopy were utilized as the primary methods to characterize the constructed devices. A confocal Raman spectrometer with a center wavelength of 532 nm was implemented to evaluate the structure of the device via Raman and PL spectra. The thickness and roughness of the sample were determined using atomic force microscopy. Electrical measurements were equipped with Keithley 2636B and photocurrent measurements were conducted with xenon lamps and monochromators. Monochromatic lasers with varied wavelengths (405, 532, 635, 808, 1060, and 1310 nm) were employed as light sources. The incident power was calibrated with Thorlabs S120VC silicon photodiodes. Photocurrent mapping measurements were performed using a Mstater200 high-precision photocurrent scanning testing microscope.
APPENDIX C: SUPPLEMENT OF THE ALGORITHM
Details of Finite-Difference Time-Domain Simulations
The reflectance spectra, absorption spectra, and optical field distributions are calculated by the finite-difference time-domain (FDTD) method. In this model, a Drude model is fitted with a quartz substrate (), periodic disk arrays (2.5 μm in periodicity, 1.5 μm in diameter, and 40 nm in thickness), and a 1 nm layer defined from bottom to up, where the dielectric constants of gold have been taken from Johnson and Christy, and the refractive index of the has been taken from the reported values [61], with periodicity in the in-plane () direction with periodic boundary conditions and in the excitation () direction with perfectly matched layer (PML) boundary conditions. The planar wave source is illuminated along the -axis on every single cell of the disk array. The grid for each simulation is set to 2 nm in both the and directions and 0.8 nm in the direction. The results are obtained after convergence of the simulations. The absorption of the structure is calculated from the results of the transmission and reflection using the formula . The electric field distributions of the interface between and gold disks are also studied at fixed wavelengths of 405 nm, 532 nm, 635 nm, 808 nm, 1060 nm, and 1310 nm.
Details of First-Principles Calculations
The model is constructed on the primitive cell of pristine . In order to eliminate periodic interactions, a vacuum of 30 Å is implemented in the direction. The band structure calculations are performed using the Vienna Ab initio Simulation Package [62,63] with a method of projector augmented wave (PAW) and the Perdew-Burke-Ernzerhof form of the generalized gradient approximation (PBE-GGA) [64,65]. The norm-conserving pseudopotential method [66,67], with a cutoff energy of 400 eV, is employed to characterize the electron-nuclei interactions. The Brillouin zone integration is performed using k-point meshes according to the scheme proposed by Monkhorst-Pack. Additionally, the DFT-D3 method [68] is employed to incorporate van der Waals interactions in all the calculations.
APPENDIX D: SUPPLEMENT OF CALCULATION OF PERFORMANCE PARAMETERS FOR PHOTODETECTORS
Responsivity (R), detectivity (D*), and response speed are critical performance parameters for photodetectors. To further analyze the photodetection performance of the photodetectors with and without plasmonic disk arrays, we calculate the performance parameters using the following equations [69–71]: where is the photocurrent (), and are the device current under illumination and dark, is the incident light power density, is the electronic charge, and is efficient area of the device. In this experiment, is , of the pristine device is , and of the plasmon-enhanced 2D device is .
Response speed is a crucial parameter that measures the ability of a photodetector to respond to rapidly changing optical signals and reflects the speed at which a photodetector converts an optical signal into an electrical signal in a short period of time. In the time domain, rise time () and fall time () are defined as the time interval required from 10%/90% to 90%/10% of the photocurrent [72].
APPENDIX E: SUPPLEMENT OF FIGURES AND TABLE IN THE EXPERIMENT
Details of Figures in the Experiment
Figure 6 demonstrates electric field distributions of interface between and gold disks under different wavelengths. Figure 7 demonstrates Raman spectra of the sheet before and after thermal treatment. Figure 8 demonstrates the morphologies of the sheet with and without gold disks. Figures 9 and 10 demonstrate the responsivity and detectivity of the plasmonic 2D photodetector, repectively. Figure 11 demonstrates the photoresponse enhancement of the plasmonic 2D photodetector under 405–808 nm illumination. Figure 12 demonstrates the photoresponse of the plasmonic 2D photodetector at 1060 nm. Figure 13 demonstrates the photoswitching behavior of the plasmonic 2D photodetector at 635 nm. Figure 14 demonstrates the temporal response of the plasmonic 2D photodetector. Figure 15 demonstrates the bandgap change of under different strains. Figure 16 demonstrates the relative Raman shift of the regarding the morphology of a gold disk.
Figure 6.(a)–(f) Electric field distributions of interface between and gold disks under the wavelengths of 405 nm, 532 nm, 635 nm, 808 nm, 1060 nm, and 1310 nm light illumination. The maximum value of the color bar is the maximum value of their respective electric field at each wavelength. The minimum value of the color bar is set to 0.8 (). The positions with relative electric fields are given the same color as 0.8. The value of 0.8 corresponds to the electric fields at the surface of a blank silica substrate without other structures under plain wave incidence. Under such settings, the colors differing from the color of 0.8 indicate enhancements when compared with a blank substrate. Thus, these figures can indicate the spatial areas where electric fields are enhanced.
Figure 7.Comparison of Raman spectra of the sheet before and after the thermal treatment, which shows that the treatment at 90°C for 5 min has no observable influence on the sheet.
Figure 8.(a) Optical microscope image of pristine device. (b) AFM morphology of material in the pristine device, the thickness of which is 33 nm. (c) AFM image of material in the plasmon-enhanced 2D photodetector, the thickness of which is 30 nm. (d) SEM image of gold disk arrays, displaying a uniform diameter.
Figure 9.(a)–(e) Mapping images of responsivity of the plasmon-enhanced 2D photodetector at different bias voltages and incident power densities under 405–1060 nm illumination. The maximum value of responsivity can reach 242 A/W.
Figure 10.(a)–(e) Mapping images of detectivity of the plasmon-enhanced 2D photodetector at different bias voltages and incident power densities under 405–1060 nm illumination. The peak values at low power intensity and high positive bias can be achieved. This reflects the excellent ability of the plasmon-enhanced 2D photodetector for detecting low light. The maximum value of detectivity can reach Jones.
Figure 11.(a)–(c) characteristic curves of the pristine (black dashed line) and the plasmon-enhanced 2D photodetector (color line) at a variety of intensities under 405–808 nm illumination. (d)–(f) Responsivity of the pristine and the plasmon-enhanced 2D photodetector as a function of light power intensity at a bias voltage of 1 V under 405–808 nm illumination. The responsivity of the plasmon-enhanced 2D photodetector was up to 307 folds higher than that of the pristine . (g)–(i) Detectivity of the pristine and the plasmon-enhanced 2D photodetector as a function of light power intensity at a bias voltage of 1 V under 405–808 nm illumination. The detectivity of the plasmon-enhanced 2D photodetector was up to 297 folds higher than that of the pristine .
Figure 12.Responsivity and detectivity of the plasmon-enhanced 2D photodetector as a function of light power intensity at a bias voltage of 1 V under 1060 nm illumination. As for the characteristic curve of the plasmon-enhanced 2D photodetector under 1060 nm illumination, it has been shown in the paper and the pristine device has no response at this wavelength.
Figure 13.Photoswitching behavior of the plasmon-enhanced 2D photodetector at a bias voltage of 1 V under 635 nm illumination with a power density of . Encouragingly, the plasmon-enhanced 2D photodetector has an excellent switching behavior, demonstrating remarkable repeatability as well as stability in operation.
Figure 14.Normalized photocurrent versus time photoswitch characteristic curves of the pristine and the plasmon-enhanced 2D photodetectors at different wavelengths of 405–1310 nm. The response time (rise time and fall time) of the plasmon-enhanced 2D photodetector is slightly faster than that of pristine under 405–808 nm illumination. The plasmon-enhanced 2D device has a significant response while the pristine device has no response at all under 1060–1310 nm illumination, confirming that the plasmon-enhanced 2D device is capable of detecting visible to near infrared light.
Figure 15.Bandgap change of under different strains. It quantifies the bandgap reduction of 40 meV under an average 0.3% tensile strain. Narrowing the bandgap enlarges the absorption cutoff wavelength, broadening the detection spectrum for the plasmon-enhanced 2D photodetector.
Figure 16.Relative shift of peak of the around a plasmonic disk under 532 nm laser excitation. The plotted data are got from the spatial distribution of the peak Raman shifts, and the values are corresponding to the differences between the peaks’ wave numbers at each point and the minimum wave number of the peaks in the measurement. As indicated by the distribution of the relative shift of peak and the profile of the plasmonic disk, the induced strain is strongly correlated with the pattern of the Au disk.
Performance of the plasmon-coupled photodetector is compared with other -based photodetectors, as shown in Table 1. Among the existing literatures based on photodetectors, only four of them can reach 1310 nm detection wavelength, but all of these have involved doping or bulk materials. Meanwhile, there is only one device whose detectivity is higher than that of this work, but its responsivity is low and does not reflect the widening of the detection range.