Photonics Research, Volume. 12, Issue 7, 1527(2024)

Polygon search algorithm for ultra-compact multifunctional integrated photonics design Editors' Pick

Te Du1,2, Zheng Peng3, Peixin Huang4, Zhaojian Zhang1, Hansi Ma1,3, Xinpeng Jiang1, Jie Huang5, Mingyu Luo1,6,8、*, Hongxin Zou2,7,9、*, and Junbo Yang1,10、*
Author Affiliations
  • 1Center of Material Science, College of Science, National University of Defense Technology, Changsha 410073, China
  • 2Institute for Quantum Science and Technology, College of Science, National University of Defense Technology, Changsha 410073, China
  • 3College of Computer, National University of Defense Technology, Changsha 410073, China
  • 4College of Systems Engineering, National University of Defense Technology, Changsha 410073, China
  • 5Defense Innovation Institute, Academy of Military Sciences, Beijing 100071, China
  • 6Photonics Research Institute, Department of Electrical and Electronic Engineering, The Hong Kong Polytechnic University, Hong Kong 999077, China
  • 7Hunan Key Laboratory of Mechanism and Technology of Quantum Information, Changsha 410073, China
  • 8e-mail: luomingyu20@163.com
  • 9e-mail: hxzou@nudt.edu.cn
  • 10e-mail: yangjunbo@nudt.edu.cn
  • show less

    Ultra-compact multifunctional integrated photonic modules have great practical significance to photonic integrated circuits (PICs). However, the design effect and efficiency of the existing mainstream inverse design algorithms are incompetent when designing these modules. We analyze their shortcomings in this task, and propose a new, to our knowledge, inverse design algorithm named polygon search (PS) algorithm to address these problems. We utilize the PS algorithm to design an integrated dual-channel mode-conversion-crossing waveguide module. This module integrates three functions: interconversion between TE0 and TE1, interconversion between TE0 and TE2, and channel crossing within only a 4 μm×4 μm footprint, and its performance is verified by experimental testing. It not only greatly reduces the total footprint of many PICs but also greatly improves their fabricating robustness. Furthermore, we propose a PS-designed mode mixer and a PS-designed bending waveguide, and connect them with the integrated modules to form a four-channel crossing-mode-division-multiplexing system. This system can provide multiple modes on the basis of channel crossing and transmit the output signal in the same direction in parallel within a single output waveguide, which significantly increases the communication bandwidth and decreases the footprint of PICs. At last, we demonstrate the effect and efficiency advantages of the PS algorithm over several mainstream inverse design algorithms by a comprehensive contrast experiment and explain these advantages in theory from several perspectives.

    1. INTRODUCTION

    Photonic integrated circuits (PICs) play a critical role in optical computing, optical interconnection, and signal processing [15]. Compared with conventional circuits, PICs have larger bandwidths, lower power consumption, and higher data rates [15]. The critical basis of PICs is the photonic devices. A large number of basic photonic devices are connected to form complex PICs [315]. In recent years, inverse design algorithms have provided a significant impetus for the development of photonic devices. The inverse design algorithms usually enable the resulting photonic devices to have a significantly smaller footprint [7,9,1618]. Moreover, the inverse design algorithms are highly flexible and are not constrained by conventional design logics [2,1927]. Over the years, many inversely-designed photonic devices have been proposed, promoting the development of PICs extensively [6,7,28].

    However, in the field of inverse-designed photonics, there are three problems to be solved. First, single-function devices cannot adapt to the development requirements of large-scale PICs. With the increasing scale of PICs, the demand for functionality and count of photonic devices also increases rapidly. However, if people separately design a device for each function, the device count in large-scale PICs will be huge, making it difficult to improve their compactness. In addition, the fabricating robustness of devices with different structures is different. Therefore, the performance of many devices in large-scale PICs may deteriorate after fabricating, thus affecting the performance of PICs. Second, the existing inverse design algorithms are incompetent in meeting the requirements of designing ultra-compact complex photonic devices, and their optimization efficiency is insufficient. For example, the brute-force search of the pixelated region in a direct binary search (DBS) algorithm easily leads to local convergence, which makes it hard to design highly integrated devices. For another example, the genetic algorithm (GA) usually produces a large number of individuals with a deteriorated evaluation index in its iteration process, which leads to high computational cost. Third, with the increasing processing ability of PICs, the existing PIC components, such as optical interconnection systems, cannot meet the bandwidth requirements of PICs. Adequate optical communication bandwidth is the basis of high-speed optical computing and optical signal processing. Therefore, there is a strong demand for technologies to increase the bandwidth of PIC components.

    For these problems, there are the following three solutions. For the first problem, a practical solution is to design ultra-compact multifunctional integrated photonic devices [15,29,30]. First, these devices can significantly reduce the count of to-be-designed devices in PICs. The multifunctional integrated devices can replace the single-function devices whose functions are covered by their functions. In some situations, a single or a few multifunctional integrated devices can replace a region of a PIC completely, reducing the design cost significantly. Second, these devices can reduce the footprint of PICs by replacing single-function devices or regions. Third, these devices can improve the fabricating robustness of PICs. If multifunctional integrated devices with the same structure are used to replace some single-function devices or regions, thereby reducing the count of device structures in the PIC, the risk of performance deterioration caused by the inconsistent fabricating robustness of multiple devices can be reduced. For the second problem, a new inverse design algorithm with stronger design ability needs to be proposed. An algorithm with high efficiency and robustness is more competent in designing ultra-compact complex devices, including ultra-compact multifunctional integrated devices. For the third problem, in recent years, the proposed mode division multiplexing (MDM) technology provides a new scheme to exponentially increase the bandwidth of optical communication [710].

    According to the above solutions, we perform the following works. First, we propose a new algorithm named polygon search (PS) algorithm, which has obvious advantages over the existing mainstream inverse design algorithms in terms of effect and efficiency. By introducing the “trial and compare” strategy into the shape-optimizing framework, the PS algorithm can maintain a high search speed in an ample search space. Therefore, it can improve the optimization effect and efficiency simultaneously. In addition, the PS algorithm can take advantage of an approximate gradient or neural network to predict better structures, thus accelerating the optimization process and enhancing its robustness. Neural networks are powerful computational models that have been widely used in photonic device design [31,32]. After appropriate training, the neural networks can give a direct mapping of the input (e.g., structure parameters) and output (e.g., optical response) in a particular range without consuming massive computation to simulate [33]. This advantage can be used not only to optimize the structural parameters of photonic devices directly but also to predict the optimal optical response and the corresponding device structure in a particular range [3436]. Second, we use the PS algorithm to integrate the functions of two kinds of mode conversions and channel crossings into one device and design an integrated dual-channel mode-conversion-crossing waveguide (DCMC-CW) module. Mode conversion is a highly versatile technique that serves as a crucial foundation for multimode communication, asymmetric optical power transmission, and integrated photonics [37]. Besides, it is an important application scenario for on-chip metasurfaces [38]. In recent years, there have been a variety of mode conversion functions realized by on-chip metasurfaces, proving their wide application prospect. The proposed integrated DCMC-CW module can realize the interconversion between TE0 and TE1, the interconversion between TE0 and TE2, and channel crossing. These three functions are integrated within only 4  μm×4  μm. The integrated module can not only completely replace a functional region in a PIC in some cases but also be used as a mode converter or a crossing waveguide. Third, we combine the integrated module with several PS-designed mode mixers and PS-designed crossing waveguides to form several multi-channel crossing-mode-division-multiplexing (CMDM) systems. Multi-channel CMDM systems can provide multiple modes on the basis of channel crossing and make the output signal in the same direction be transmitted in parallel within a single output waveguide. These characteristics significantly increase the communication bandwidth and decrease the footprint of PICs.

    In this paper, we first explain the theoretical basis and principle of the PS algorithm in detail. Then, we introduce the application of the integrated DCMC-CW module and multi-channel CMDM systems. In addition, we also perform simulations and experimental testing to illustrate their excellent performance. At last, we demonstrate the effect and efficiency advantages of the PS algorithm over the mainstream inverse design algorithms by a comprehensive contrast experiment involving 40 complete design processes.

    2. METHODS AND DESIGN PROCESS

    A. Theoretical Basis and Principle of the PS Algorithm

    Before proposing a new algorithm, we analyze the characteristics of the existing algorithms. We find that the “trial and compare” search strategy of the DBS algorithm enables relatively high optimization efficiency by preventing the deterioration of the evaluation index. In addition, the excellent implementation of complex devices of many shape-optimizing algorithms also benefits from the wide search space provided by the continuous device shapes [3941]. Therefore, we consider introducing the “trial and compare” strategy into the shape-optimizing framework to improve the design efficiency and effect simultaneously. Our main ideas are the following. First, we set the structure of the device to be designed as a polygon prism. Then, we move the first vertex several times to find a position that improves the evaluation index. After these, we move the other vertices in turn. In the search process of each vertex, the evaluation index keeps undeteriorating through the “trial and compare” strategy. In addition, benefiting from the continuity of polygon shape, the optimization effect and efficiency can be improved by “approximate gradient prediction” or “neural network prediction.” After several trials of each vertex, the approximate gradient or neural network can be used to predict a vertex position with a high probability of improving the evaluation index. The specific meaning of the “trial and compare” strategy is described in Appendix A.

    Based on the above ideas, we propose the specific principle of the PS algorithm as the following steps.

    In the first step, the PS algorithm introduces the initial structure of the device in the design region. The initial structure is a polygon prism with a polygon as the base and the pre-set thickness as the height. The polygon base is connected by several vertices in the x-y plane of the design region. After this, the PS algorithm calculates the figure of merit (FOM) of the initial device as the initial FOM.

    In the second step, the PS algorithm moves the first movable vertex to search for a better position near its initial position. When changing the vertex position, the PS algorithm keeps the changed position relatively close to its initial position. Each time the vertex changes position, the shape of the polygon changes, resulting in a new device and a new FOM. This step can be further divided into two sub-steps: first, the PS algorithm moves this vertex near its initial position in the x-y plane several times and calculates the corresponding FOMs; second, according to the information provided by all the positions and their corresponding FOMs, the PS algorithm predicts a position that may improve the FOM, moves this vertex to the predicted position, and calculates its corresponding FOM. Then, the PS algorithm locates this vertex to the position corresponding to the optimal FOM. The prediction can be implemented in many ways. This paper provides two prediction methods: approximate gradient prediction and neural network prediction. Each movement of a vertex is called a “trial.” Each second step operated on a vertex is called a “search.” The schematic of this step is shown in Fig. 1(a).

    Detail of the principle of the PS algorithm. (a) Schematic of the second step: search process of the first vertex. (b) Flow chart of the PS algorithm.

    Figure 1.Detail of the principle of the PS algorithm. (a) Schematic of the second step: search process of the first vertex. (b) Flow chart of the PS algorithm.

    In the third step, the PS algorithm operates the second step for the following vertices in turn. After all vertices are searched once, the PS algorithm completes a loop.

    In the fourth step, the PS algorithm starts from the first vertex again and then operates the second and third steps until each vertex is searched for the pre-set number of loops.

    The above optimization steps are shown in Fig. 1(b). In each of the above steps, the specific parameter values or moving directions can be set by the designer. More details are presented in Appendix A.

    B. Design Process of the Integrated DCMC-CW Module

    According to the principle of the PS algorithm, we design an integrated DCMC-CW module, and the specific parameter settings are shown below. The basic simulation model is set as a commercial SOI wafer with a 220-nm-thick top silicon layer and a 3-μm-thick buried oxide layer. The fixed structures are four fixed 1.5-μm-wide waveguides set in the top silicon plane of the SOI. The design region (air filling) is also set in this plane. The center of the operating wavelength is set to 1.55 μm.

    For the first step, the initial structure of the integrated DCMC-CW module is a polygon prism with a pre-set polygon as the base and 220 nm as the height. All these elements are shown in the left figure of Fig. 2(a). The polygon base is connected by 52 vertices, as shown in the right figure of Fig. 2(a). The positions of some vertices are fixed to ensure that several contours of the polygon coincide with the fixed waveguides. Throughout the optimization, the height and material of the polygon prism are fixed. The FOM of the initial device is calculated as the initial FOM. For the integrated module, FOM is defined as follows: FOM=TL1((x1,y1),(x2,y2),,(x52,y52))+TT2((x1,y1),(x2,y2),,(x52,y52)),where TL1 represents the transmission of TE1 (at right port) when TE0 is input in the left port, and TT2 represents the transmission of TE2 (at bottom port) when TE0 is input in the top port. (x1, y1) represents the coordinate of the first vertex. The mapping between the transmission and coordinates of all vertices is obtained by simulation. When the FOM increases, it means that the mean efficiency of mode conversion in both directions is increased, and the insertion losses of the device decrease.

    Design process of the integrated DCMC-CW module. (a)–(d) Outline of the design process, where the right figures of (a)–(d) are the corresponding polygons of the structures in the left figures of (a)–(d), respectively.

    Figure 2.Design process of the integrated DCMC-CW module. (a)–(d) Outline of the design process, where the right figures of (a)–(d) are the corresponding polygons of the structures in the left figures of (a)–(d), respectively.

    For the second step, the move method of the first movable vertex is that the PS algorithm moves it 50 nm to the left, right, up, and down of the initial position (these new positions are called “trial position”), respectively. The prediction method is approximate gradient prediction. A new polygon prism and its polygon base after the move are shown in Fig. 2(b).

    For the third step, the search count is 44 in a loop. The structure and its corresponding polygon base after the first loop are shown in Fig. 2(c).

    For the fourth step, the total number of loops is 20 (4400 computations). The optimized structure and its corresponding polygon base of the integrated DCMC-CW module are shown in the left and right figures of Fig. 2(d).

    In the design process, the specific process of the approximate gradient prediction can be described as follows. First, the PS algorithm finds the maximum FOM of the existing five FOMs and its corresponding trial position α, and uses linear or quadratic functions to fit the changes of the FOM along the connecting lines between α and other trial positions, as shown in Figs. 3(a) and 3(b). Then, the PS algorithm calculates the slopes at α of each function. Second, the PS algorithm finds the maximum slope S and the connecting line corresponding to S. The direction in which the FOM increases along this connecting line is set to the direction of the approximate gradient of the FOM at α. Third, starting from α, the PS algorithm moves this vertex with a distance in the direction of the approximate gradient and denotes this trial position as β, as shown in Fig. 3(c). The move distance can be determined by the designers. Fourth, the PS algorithm calculates the FOM corresponding to β and compares it with the FOM corresponding to α. If the FOM corresponding to β is the larger one, the vertex is located at β. Otherwise, it is located at α.

    Two prediction methods of the second step. (a)–(c) Using the approximate gradient to predict a better vertex position. (a), (b) Linear and quadratic function fittings. (c) Predict β by the approximate gradient. The FOM corresponding to each x-y coordinate represents the FOM when the vertex searching for the best position is at that x-y coordinate, while the positions of other vertices are unchanged. (d)–(f) Using a neural network to predict a better vertex position. (d) Sampling in the prediction region. (e) Schematic of a neural network. (f) Predict β by a neural network.

    Figure 3.Two prediction methods of the second step. (a)–(c) Using the approximate gradient to predict a better vertex position. (a), (b) Linear and quadratic function fittings. (c) Predict β by the approximate gradient. The FOM corresponding to each x-y coordinate represents the FOM when the vertex searching for the best position is at that x-y coordinate, while the positions of other vertices are unchanged. (d)–(f) Using a neural network to predict a better vertex position. (d) Sampling in the prediction region. (e) Schematic of a neural network. (f) Predict β by a neural network.

    In addition, the specific process of the neural network prediction can be described as follows. First, the PS algorithm finds α. Second, the coordinates of the five trial positions [(x1,y1)(x5,y5) in Fig. 3(f)] are taken as inputs, and the corresponding FOMs are taken as outputs to train a neural network, as shown in Fig. 3(e). Third, the PS algorithm delimits a prediction region around the five trial positions and samples a certain number of coordinates in the prediction region [(xi,yj),(xm,yn), in Fig. 3(d)] as input, as shown in Fig. 3(d). Then, the trained neural network is used to calculate the FOM [FOM1FOMt in Fig. 3(e)] corresponding to each coordinate. Fourth, the PS algorithm finds the max FOM (FOMp) calculated by the neural network and its corresponding position β(xp,yp) and moves the vertex to β, as shown in Fig. 3(f). The remaining process is the same as that in the approximate gradient prediction.

    3. APPLICATIONS AND PERFORMANCE

    A. Applications and Performance of the Integrated DCMC-CW Module(s)

    The integrated DCMC-CW module can selectively achieve interconversion between TE0 and TE1 or TE0 and TE2. Therefore, a single or a pair of integrated modules can interconvert these three modes, as shown in Figs. 4(a) and 4(d). Apart from functioning as a multimode converter, the integrated module can act as a crossing waveguide for low-loss channel crossing in multi-channel communication, as shown in Fig. 4(a).

    Simulation and experimental testing results of the integrated DCMC-CW module(s). (a) Scanning electron microscopy (SEM) image of an integrated DCMC-CW module. (b), (c) Electromagnetic field distribution in a single integrated module when TE0 is input in the left and top ports. (d) SEM image of two integrated DCMC-CW modules connected for the interconversion between TE1 and TE2. (e) Electromagnetic field distribution in two integrated modules. (f) Simulated and experimental tested transmission when TE0 is input in different ports of a single integrated module. (g) Simulated and experimental tested transmission when two integrated modules are used for interconversion between TE1 and TE2.

    Figure 4.Simulation and experimental testing results of the integrated DCMC-CW module(s). (a) Scanning electron microscopy (SEM) image of an integrated DCMC-CW module. (b), (c) Electromagnetic field distribution in a single integrated module when TE0 is input in the left and top ports. (d) SEM image of two integrated DCMC-CW modules connected for the interconversion between TE1 and TE2. (e) Electromagnetic field distribution in two integrated modules. (f) Simulated and experimental tested transmission when TE0 is input in different ports of a single integrated module. (g) Simulated and experimental tested transmission when two integrated modules are used for interconversion between TE1 and TE2.

    In this section, we verify the performance of the integrated DCMC-CW module in mode conversion and channel crossing by simulation and experimental testing. For a single integrated module, the simulated and experimental tested transmissions of different modes when TE0 is input in different input ports are shown in Fig. 4(f). The corresponding electromagnetic field distribution in the different situations is shown in Figs. 4(b) and 4(c), respectively. In addition, when two integrated modules are used for interconversion between TE1 and TE2, the simulated and experimental tested transmissions of different modes when TE1 is input in the left input port are shown in Fig. 4(g). The corresponding electromagnetic field distribution in these two integrated modules is shown in Fig. 4(e).

    According to the simulation results, the insertion losses (ILs) and maximum crosstalks (CTs) of a single integrated module are 0.45 dB and 22.10  dB at 1.55 μm when TE0 is input in the left port, and 0.38 dB and 29.21  dB at 1.55 μm when TE0 is input in the top port. Another important result is that the ILs and the CTs of a single integrated module are always less than 0.79 dB and lower than 16.77  dB in the working band (1.45–1.65 μm) when TE0 is input in any port. When two integrated modules are used for interconversion between TE1 and TE2, the IL is 0.99 dB, and the CT is 17.90  dB at 1.55 μm. In addition, the IL is always less than 1.60 dB, and the CT is always lower than 15.51  dB in the whole working band. These results represent the performance of a single integrated module in mode conversion and channel crossing. In this paper, the IL is defined as follows: IL=10×log10(ToutTin),where Tin and Tout are the transmission of the input mode and the target output mode, respectively. Similarly, the CT is defined as follows: CT=10×log10(ToutTin),where Tout is the transmission of the nontarget output mode.

    In summary, the simulation results demonstrate that the integrated DCMC-CW module has a good performance in mode conversion and channel crossing, and the ILs and CTs of its two channels are very low. In addition, in the 200-nm-wide working band, the extinction ratios (ERs) can always reach more than 16 dB for a single integrated module and 13.91 dB for two integrated modules, which proves that the integrated module can operate over a wide band. The ER is defined as follows: ER=ILCT.

    After the experimental testing, we find that whether for a single module or the combination of two modules, there is a good agreement between the experimental testing and simulation results, proving the correctness of the simulation results. The results are all shown in Figs. 4(f) and 4(g). The simulation and experimental testing results show that the integrated DCMC-CW module performs excellently in mode interconversion and channel crossing, which proves the effectiveness of the PS algorithm.

    B. Applications and Performance of the Multi-channel CMDM Systems

    In addition to their rich set of functions, integrated DCMC-CW modules can achieve various complex functions through combinations. An important application of integrated DCMC-CW modules is constituting multi-channel CMDM systems.

    PIC-based optical chips have been widely used in neuromorphic photonics, all-optical neural networks, and photonic reservoir computing [3249]. However, due to the two-dimensional layout of most PICs, crossing among multiple channels in optical chips is almost inevitable. In addition, with the growth of the processing ability of optical chips, the demand for inter-chip communication bandwidth is increasing [7,9,10,16,5052]. The integrated DCMC-CW module provides a novel approach to address these two significant challenges about optical chips by constituting multi-channel CMDM systems, as shown in Figs. 5(a) and 5(b). Signals (TE0) generated by different processing modules enter the multi-channel CMDM system from their corresponding input ports. After that, signals are crossed and mode-converted several times in the system and then enter the mode mixer in different modes. Then, these different-mode signals are transmitted in the bus waveguide simultaneously. Compared with the conventional channel crossing regions, the multi-channel CMDM system can provide multiple modes on the basis of channel crossing and make the output signal in the same direction be transmitted in parallel within a single output waveguide, which significantly increases the communication bandwidth and decreases the footprint of PICs. A three- to six-channel CMDM system can be realized by connecting several identical integrated modules and other elements in a pre-set way. As an example, we design a TE0TE1 mode mixer and a TE0 bending waveguide using the PS algorithm and connect them with several integrated modules to form a kind of configuration of the four-channel CMDM system, as depicted in Fig. 5(b). The concept figures of the other multi-channel CMDM systems are presented in Appendix B.

    Four-channel CMDM system and its performance. (a) Four-channel CMDM system applied in optical computing. (b) SEM image of a kind of configuration of the four-channel CMDM system. (c) Electromagnetic field distribution in the system in (b) when all the channels have signal input. (d) ILs and CTs of every channel in the working bandwidth.

    Figure 5.Four-channel CMDM system and its performance. (a) Four-channel CMDM system applied in optical computing. (b) SEM image of a kind of configuration of the four-channel CMDM system. (c) Electromagnetic field distribution in the system in (b) when all the channels have signal input. (d) ILs and CTs of every channel in the working bandwidth.

    The performance of this four-channel CMDM system is verified by simulation. The electromagnetic field distribution in this system when all channels have a signal input is shown in Fig. 5(c). The ILs and CTs of every channel in the working bandwidth are shown in Fig. 5(d).

    The simulation results show that the four-channel CMDM system has low ILs and CTs in every channel. The average IL and average maximum CT of the system are 0.96 dB and 20  dB at 1.55 μm, respectively. In addition, the mode conversion rate of this system also reached a high degree. The average ER of this system is 20.00 dB at 1.55 μm, which shows the practicability of this system. The specific results are presented in Appendix B.

    4. DISCUSSION

    In discussion, we demonstrate the effect and efficiency advantages of the PS algorithm over other main-stream inverse design algorithms: the DBS algorithm, the GA, and the adjoint method (AM) by a comprehensive contrast experiment involving 40 complete design processes of an integrated DCMC-CW module. In this contrast experiment, there are 10 examples of completely designing an integrated DCMC-CW module for each algorithm. In order to make the contrast experiment convincing enough, we set four initial structures, as shown in Appendix C.1. Every initial structure is optimized by each algorithm in the contrast experiment. To exclude the influence of unrelated factors, such as computer performance, we select the calculation count consumed by each algorithm to be the evaluation index for its optimization efficiency. More detailed parameter settings of this contrast experiment are also presented in Appendix C.1. The formulae of FOMs of all algorithms are the same.

    After the contrast experiment, the best optimization examples (most efficient or effective) of each algorithm are shown in Table 1. More detailed results of this contrast experiment are presented in Appendix C.2.

    Best Optimization Examples of Each Algorithm

    Computation Number at Different Average IL
    Example3 dB2 dB1 dB0.5 dBTotal Computation NumberFinal Average IL
    PS 7a290316561227133000.41 dB
    DBS 3198927215558Unrealized80000.80 dB
    DBS 467813754838Unrealized57800.94 dB
    GA 811193661UnrealizedUnrealized80001.34 dB
    GA 107111812UnrealizedUnrealized80001.55 dB
    AM 3/b///1395c0.68 dBc

    The example that is the most efficient and effective.

    (1) Only the numerical distribution of the refractive index is provided without the device structure to be inserted. (2) Although the corresponding FOM may be achieved after one optimization, the results may deteriorate further.

    For ease of comparison: the PS 7 takes approximately 970 computations to reach the final average IL of AM 3.

    The specific initial structures of the best examples in Table 1 are shown in Figs. 6(a)–6(f). The final structures optimized by these four algorithms are shown in Figs. 6(g)–6(l). It can be seen intuitively that the PS-optimized module has a relatively simple structure, which is a favorable condition for fabrication. The comparison of the optimization processes of the best examples is shown in Fig. 6(m).

    Contrast experiment of the PS algorithm and some mainstream inverse design algorithms. (a)–(f) Initial structures of the best examples shown in Table 1. (g)–(l) Final structures with an optimal performance. (m) Comparison of the optimization processes of the best examples.

    Figure 6.Contrast experiment of the PS algorithm and some mainstream inverse design algorithms. (a)–(f) Initial structures of the best examples shown in Table 1. (g)–(l) Final structures with an optimal performance. (m) Comparison of the optimization processes of the best examples.

    Table 1 and Fig. 6 show that the PS algorithm has a noticeable effect and efficiency advantage compared with the mainstream inverse design algorithms. In each stage of the optimization process, the PS algorithm can maintain a high speed of device performance improvement. Besides, the PS algorithm can improve the device performance to a degree that is difficult for other algorithms to achieve. This performance advantage will increase exponentially when multiple identical devices are cascaded.

    The theoretical explanations for the effect and efficiency advantage of the PS algorithm mainly include the following five aspects. (1) If the number of the movable vertices of an initial polygon is N, the dimension of the search space for PS optimization is 2×N. Such a high-dimensional search space ensures a high search freedom of the PS algorithm. (2) The random walk produced by vertex position prediction in each search can enhance the robustness of the PS algorithm to avoid premature local convergence. (3) The shape optimization framework provides certain constraints for the initial optimization stage, so that the PS algorithm searches for the refractive index distribution mainly in the regions near the initial structure at the beginning. This assignment of search weights allows the PS algorithm to focus its search on regions where changes in refractive index distribution are more likely to significantly alter FOM. (4) Compared with pixelated optimization algorithms, the shape optimization framework can make the PS algorithm integrate with the approximate gradient or neural networks better. With the help of these efficient and powerful tools, the PS algorithm can predict better structures more effectively than brute force search. (5) The “trial and compare” strategy can prevent the deterioration of the evaluation index after every search. In addition, although there may be some small regions in the PS-designed results that are difficult to implement in accordance with the original appearance entirely after fabricating, the impact of this issue on the PS-designed devices is small, as detailed in Appendix D.

    5. CONCLUSIONS

    In this paper, to solve the problems that exist in the field of inversely designed photonics, we perform the following works. First, we propose a new inverse design algorithm named PS algorithm to solve the problems of poor effect and low efficiency faced by the existing algorithms in the design of ultra-compact multifunctional integrated photonic devices. This algorithm possesses multiple theoretical advantages by introducing the “trial and compare” strategy into the shape-optimizing framework. Second, utilizing the PS algorithm, we design an ultra-compact integrated DCMC-CW module. The integrated DCMC-CW module(s) can achieve interconversion between any two of TE0, TE1, and TE2 and enable channel crossing. The footprint of an integrated DCMC-CW module is only 4  μm×4  μm. Simulations and experimental testing show that the module has low ILs, low CTs, and high ERs. Third, we combine the integrated module with several PS-designed mode mixers and PS-designed crossing waveguides to form several multi-channel CMDM systems. Compared with the conventional channel crossing regions, the multi-channel CMDM system can provide multiple modes on the basis of channel crossing and make the output signal in the same direction be transmitted in parallel within a single output waveguide, which significantly increases the communication bandwidth and decreases the footprint of PICs. At last, we perform a comprehensive contrast experiment to demonstrate the wide practicality and advantages in terms of the optimization effect and efficiency of the PS algorithm. This algorithm, the integrated DCMC-CW module, and the multi-channel CMDM systems are expected to further facilitate the development of inversely-designed integrated photonics.

    APPENDIX A: DETAILS OF THE PS ALGORITHM

    The “trial and compare” search strategy of the DBS algorithm can be described as follows. After changing the state of a pixel, if the evaluation index (FOM in this paper) is better than that when the pixel is not changed, the current state of the pixel is retained; otherwise, the state of the pixel is restored to that before the change. Similarly, this strategy of the PS algorithm can be described as follows. After moving a vertex several times, the PS algorithm will pick the optimal FOM and its corresponding position. This strategy can ensure that no matter how the FOM changes after the pixel or the vertex position changes, the algorithm can always maintain an FOM that is not worse than that before the change and get its corresponding device structure.

    The following principles determine the region(s) contained in a polygon. (1) The lines between all vertices are the outer contours of the polygon. (2) The contours between vertex or contour intersections are called contour segments. (3) The contour segment that only has vertices or contour intersections as its endpoints, and does not cross any other vertex or contour intersections, is called a minimum contour segment. (4) Each minimal contour segment has only one side in the region contained by the polygon (the inside of the polygon). In general, the region(s) contained in a polygon is filled by the target material.

    For the device determined by multiple vertices in this paper, when the positions of the other vertices are fixed, if the trial position of a vertex traverses a continuous two-dimensional region, its corresponding FOM will form a continuous surface. As shown in “second step 1” in Fig. 3, because the trial positions are close to each other, the change process of FOM on the lines between these positions can be approximated as low-order functions. That is, if the vertex has trialed two positions on a particular line, the change process of FOM between these two positions on this line can be approximated by a linear function, as shown in Fig. 3(a) in the main text. If the vertex has trialed three positions on a particular line, the FOM between these three positions on this line can be approximated by a quadratic function, as shown in Fig. 3(b) in the main text. In addition, the setting that the trial positions are close to each other also makes the PS algorithm integrate with neural networks more successfully. It is characteristic of neural networks that the number of samples required for training will increase when the complexity of the change of the output is increasing [34]. Compared with a large prediction region, the changes of FOM within the prediction region around the trial positions will be simpler and smoother, so the number of samples required to train the neural network in this region will also be smaller. This setting allows us to train neural networks using five trial positions and corresponding FOMs.

    APPENDIX B: DETAILS OF CMDM SYSTEMS

    The concept figures of three- to six-channel CMDM systems composed of the integrated DCMC-CW modules are shown in Figs. 7(a)–7(d). Among them, there may be many combinations of orientation and arrangement of the integrated DCMC-CW modules in every CMDM system.

    Multi-channel CMDM systems composed by the integrated DCMC-CW modules. (a) Three-channel CMDM system. (b) Four-channel CMDM system. (c) Five-channel CMDM system. (d) Six-channel CMDM system.

    Figure 7.Multi-channel CMDM systems composed by the integrated DCMC-CW modules. (a) Three-channel CMDM system. (b) Four-channel CMDM system. (c) Five-channel CMDM system. (d) Six-channel CMDM system.

    Specific simulation results of the four-channel CMDM systems. (a)–(d) Electromagnetic field distributions in the crossing-mode-conversion region when the signal is transmitted in channels 1–4. (e)–(h) Transmission at the output port when the signal is transmitted in channels 1–4.

    Figure 8.Specific simulation results of the four-channel CMDM systems. (a)–(d) Electromagnetic field distributions in the crossing-mode-conversion region when the signal is transmitted in channels 1–4. (e)–(h) Transmission at the output port when the signal is transmitted in channels 1–4.

    APPENDIX C: SUPPLEMENT OF THE CONTRAST EXPERIMENT OF THE PS ALGORITHM AND SOME MAINSTREAM INVERSE DESIGN ALGORITHMS

    Details of Parameter Settings in the Contrast Experiment

    The contrast experiment we performed included a wide range of parameter combinations. These parameter combinations represent the most commonly used parameter choices for each algorithm. In addition, we set several extreme parameter combinations for each algorithm (PS 10, DBS 9&10, GA 10, AM 7–10) to show the adaptability or the most ideal design result of these algorithms.

    First of all, the detailed initial structures of these examples are shown in Fig. 9. If the same initial structure number appears in different sub-figures, it means that these initial structures have the same shape, but the number and position of vertices are different. This setting has no effect on the DBS algorithm and AM.

    Detailed initial structures in the contrast experiment. (a)–(c) Three kinds of initial structure 1 with different number of vertices. (a) Initial structure of PS 1, PS 2, GA 1, and GA 2. (b) Initial structure of PS 3, GA 3, and GA 4. (c) Initial structure of PS 4 and GA 5. (d) Initial structure of PS 5, PS 6, and GA 6. (e) Initial structure of PS 7, GA 7, and GA 8. (f) Initial structure of PS 10 and GA 10. (g) Initial structure of PS 8, PS 9, and GA 9. The width of the waveguides is 1.8 μm. (h) Random structure of DBS 10.

    Figure 9.Detailed initial structures in the contrast experiment. (a)–(c) Three kinds of initial structure 1 with different number of vertices. (a) Initial structure of PS 1, PS 2, GA 1, and GA 2. (b) Initial structure of PS 3, GA 3, and GA 4. (c) Initial structure of PS 4 and GA 5. (d) Initial structure of PS 5, PS 6, and GA 6. (e) Initial structure of PS 7, GA 7, and GA 8. (f) Initial structure of PS 10 and GA 10. (g) Initial structure of PS 8, PS 9, and GA 9. The width of the waveguides is 1.8 μm. (h) Random structure of DBS 10.

    The following are the details of the parameter settings of each algorithm.

    For the PS algorithm, the parameter combinations for each example are shown in Table 3. Among them, PS 10 is a specially set example with high optimization difficulty to test the adaptability of the PS algorithm to poor initial structure.

    Parameter Combinations for Each Example of the PS Algorithm

    ExamplePS 1PS 2PS 3PS 4PS 5PS 6PS 7PS 8PS 9PS 10
    Initial structure1111223443a
    Vertex number52528638464652525243
    Approximate gradient prediction
    Neural network prediction

    The difference between it and the initial structure of PS 7 is shown in Fig. 9.

    For the DBS algorithm, each pixel features two states distinguished by whether etched, and the parameter combinations for each example are shown in Table 4. Among them, DBS 9 is a specially set example with high optimization difficulty, in order to test the adaptability of the DBS algorithm to poor initial structure. In addition, DBS 10 is a specially set example with very small pixel size, which is rarely reported to explore the most ideal design result of the DBS algorithm.

    Parameter Combinations for Each Example of the DBS Algorithm

    ExampleDBS 1DBS 2DBS 3DBS 4DBS 5DBS 6DBS 7DBS 8DBS 9DBS 10
    Initial structure11223344/a1
    Pixel space10012010012010012010012012080

    The state of pixels in the design region is randomly distributed.

    For the GA, the number of individuals in every population is set to be 100. The other parameter combinations for each example are shown in Table 5. To reduce the search space dimension, we restrict the vertices in several examples to move only in the direction perpendicular to the contour where they are in the initial state. The initial structure of GA 10 is the same as that of PS 10.

    Parameter Combinations for Each Example of the GA

    ExampleGA 1GA 2GA 3GA 4GA 5GA 6GA 7GA 8GA 9GA 10
    Initial structure1111123343
    Vertex number52528686384652525243
    Direction to move a vertexAllSingleAllSingleAllAllAllSingleAllAll

    For the AM, the design region is pixelated into 10,000 pixels, and each pixel has a spacing of 40 nm. The refractive index of each pixel must be discretized in the optimization process because there are only two options (1 or 3.48) for the refractive index. In order to ensure the convergence of AM, we set the discretization rate of AM to 99.95%. That is, there will be five pixels with a refractive index between 1 and 3.48. When fabricated, these pixels will be filled with silicon or air, which may affect the final result. The other parameter combinations for each example are shown in Table 6. Among them, AM 7–9 are specially set examples with a single refractive index filled in the design region as the initial structure to test the adaptability of the AM to poor initial structures. In addition, AM 10 is a specially set example with no minimum feature size limit, which cannot adapt to fabricating conditions. This setting is to explore the most ideal design result of the AM.

    Parameter Combinations for Each Example of the AM

    ExampleAM 1AM 2AM 3AM 4AM 5AM 6AM 7AM 8AM 9AM 10
    Initial structure1122341.74 Rea3.48 Re1 Re1
    Minimum feature size100120100120120120120120120No

    The refractive index of all pixels in the design region is set to 1.74 (half the refractive index of silicon).

    Details of Results in the Contrast Experiment

    The detailed results of the comprehensive contrast experiment about the effect and efficiency of the PS algorithm, the DBS algorithm, the GA, and the AM are shown in Table 7. In this contrast experiment, each algorithm has a large number of examples, and its parameter settings cover a wide range of parameter combinations. Therefore, the best optimization effect of an algorithm shown in Table 7 can be regarded as the best effect that the algorithm can achieve in the “designing an integrated DCMC-CW module” task.

    Detailed Results in the Contrast Experiment

    ExampleTotal Computation NumberFinal Average ILExampleTotal Computation NumberFinal Average IL
    PS 144000.41 dBGA 180002.72 dB
    PS 244000.43 dBGA 280002.37 dB
    PS 378000.48 dBGA 380003.00 dB
    PS 430000.58 dBGA 410,0002.50 dB
    PS 526600.48 dBGA 580002.11 dB
    PS 647500.50 dBGA 680002.10 dB
    PS 733000.41 dBGA 780001.55 dB
    PS 855000.43 dBGA 880001.34 dB
    PS 944000.56 dBGA 980002.88 dB
    PS 1036750.97 dBGA 1080001.55 dB
    DBS 113,0111.10 dBAM 122700.71 dB
    DBS 280921.49 dBAM 215781.22 dB
    DBS 380000.80 dBAM 313950.68 dB
    DBS 457800.94 dBAM 411620.84 dB
    DBS 580000.94 dBAM 515351.02 dB
    DBS 657801.31 dBAM 610061.19 dB
    DBS 780001.16 dBAM 711453.67 dB
    DBS 857801.25 dBAM 810973.61 dB
    DBS 957802.72 dBAM 910490.73 dB
    DBS 1010,0001.00 dBAM 10442No result

    From Table 7, we can draw the conclusions, except those in the main text, as below: System.Xml.XmlElementSystem.Xml.XmlElementSystem.Xml.XmlElement

    Overall, these results not only illustrate the excellent design ability but also demonstrate the wide applicability of the PS algorithm.

    APPENDIX D: ROBUSTNESS OF THE PS-DESIGNED DEVICES TO FABRICATING DEFORMATIONS IN SMALL REGIONS

    It is a common issue that some details of the devices cannot be fabricated following the design shape affected by the fabricating technology [19,23]. Some factors, such as the reactive ion etching (RIE) lag effect [53], may lead to under-etching and make small fabricating regions deform.

    In order to investigate the robustness of the PS-designed device to fabricating deformations in small regions, we fabricate the result of PS 3, which has some difficult-to-fabricate absences. The initial and final structures of it are shown in Figs. 10(a) and 10(b). After fabrication, some absences of this integrated module disappear, as shown in Fig. 10(c).

    Robustness of the PS-designed devices to fabricating deformations in small regions. (a), (b) Initial and final structures of the integrated module in PS 3. (c) Fabricating result of the integrated module in PS 3. (d) Contrast experiment results of the final structures before (solid line) and after (dashed line) removing the small absences (the black solid line and black dashed line are very close). (e) Comparison of experimental testing and simulation results of the fabricating result in (c).

    Figure 10.Robustness of the PS-designed devices to fabricating deformations in small regions. (a), (b) Initial and final structures of the integrated module in PS 3. (c) Fabricating result of the integrated module in PS 3. (d) Contrast experiment results of the final structures before (solid line) and after (dashed line) removing the small absences (the black solid line and black dashed line are very close). (e) Comparison of experimental testing and simulation results of the fabricating result in (c).

    A contrast simulation is conducted to investigate the robustness of the integrated module in PS 3 to fabricating deformations in small regions. The simulation results of it before (solid line) and after (dashed line) the removal of the small absences are compared in Fig. 10(d). The comparison shows that the ILs and CTs of all ports are highly similar before and after the removal. The maximum difference in ILs of all ports before and after the removal is 0.04 dB (from 0.42 to 0.46 dB), whereas the maximum difference in CTs of all ports is 0.93 dB (from 23.91 to 22.98  dB) at the wavelength of 1.55 μm. Across the entire 200-nm-wide working band, the maximum difference in ILs of all ports before and after the removal is 0.11 dB (from 0.63 to 0.73 dB), whereas the maximum difference in CTs of all ports is 2.55 dB (from 22.00 to 19.45  dB). These findings demonstrate that the performance of the integrated module is almost unaffected by the removal of the small absences. More specific results are presented in Table 8.

    Specific Results of the Contrast Simulation

    InputLeft Port Input TE0Top Port Input TE0
    IL before the removal0.50 dB0.42 dB
    IL after the removal0.50 dB0.46 dB
    Difference in ILs0 dB0.04 dB
    CT before the removal−19.34 dB−23.91 dB
    CT after the removal−19.37 dB−22.98 dB
    Difference in CTs0.03 dB0.93 dB

    Experimental testing results of the integrated module in PS 3 are depicted in Fig. 10(e), where the ILs of it near the wavelength of 1.55 μm are 1.53 dB when TE0 is input in the left port and 0.55 dB when TE0 is input in the top port. Such results demonstrate that its performance is maintained well, demonstrating that the impact of the deformations is relatively small.

    Overall, the contrast simulation and experimental testing results illustrate the fabricating robustness of the PS-designed device. Our findings show that even though small details may be challenging to be implemented entirely in the fabricated device, the impact of their deformation on device performance is limited.

    [50] D. Dai, J. Wang. Multi-channel silicon mode (de)multiplexer based on asymmetrical directional couplers for on-chip optical interconnects. IEEE Photonics Soc. Newsletter, 28, 8-14(2014).

    [53] K. Abrokwah. Characterization and modeling of plasma etch pattern dependencies in integrated circuits(2006).

    Tools

    Get Citation

    Copy Citation Text

    Te Du, Zheng Peng, Peixin Huang, Zhaojian Zhang, Hansi Ma, Xinpeng Jiang, Jie Huang, Mingyu Luo, Hongxin Zou, Junbo Yang, "Polygon search algorithm for ultra-compact multifunctional integrated photonics design," Photonics Res. 12, 1527 (2024)

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Silicon Photonics

    Received: Jan. 2, 2024

    Accepted: May. 20, 2024

    Published Online: Jul. 1, 2024

    The Author Email: Mingyu Luo (luomingyu20@163.com), Hongxin Zou (hxzou@nudt.edu.cn), Junbo Yang (yangjunbo@nudt.edu.cn)

    DOI:10.1364/PRJ.514920

    CSTR:32188.14.PRJ.514920

    Topics