Chinese Journal of Lasers, Volume. 8, Issue 2, 5(1981)
Properties of steady discharge in Ar-Kr-F2 gas mixture
In this paper, some plasma properties of Ar-Kr-F2 gas mixtures are calculated and discussed under the condition of steady discharge.
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Zheng Chengen. Properties of steady discharge in Ar-Kr-F2 gas mixture[J]. Chinese Journal of Lasers, 1981, 8(2): 5
Category: laser devices and laser physics
Received: Dec. 21, 1979
Accepted: --
Published Online: Aug. 17, 2012
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CSTR:32186.14.