Chinese Journal of Lasers, Volume. 38, Issue 11, 1108001(2011)

Phase Measuring Profilometry Based on Triangular Pattern Grating

Ye Hongna* and Cao Yiping
Author Affiliations
  • [in Chinese]
  • show less

    Phase measuring profilometry (PMP) has received great attention in modern life with the advantages of high accuracy and non-contact. However, the application of PMP is limited by the complicated manufacturing technique of sinusoidal grating. Based on the basic theory of PMP, the paper presents the PMP based on the triangular-pattern grating, which is of more practical significance because its manufacturing technique is easier compared to the sinusoidal grating. In this paper, the accuracy of the two methods mentioned above are compared and analyzed. At the same time, the influence of grating period and contrast ratio as well as the maximum height of different objects on the measuring accuracy is analyzed both in ideal and practical conditions. The computer simulations and experiments show that the PMP based on triangular-pattern grating is feasible for its high accuracy.

    Tools

    Get Citation

    Copy Citation Text

    Ye Hongna, Cao Yiping. Phase Measuring Profilometry Based on Triangular Pattern Grating[J]. Chinese Journal of Lasers, 2011, 38(11): 1108001

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: measurement and metrology

    Received: Apr. 6, 2011

    Accepted: --

    Published Online: Sep. 27, 2011

    The Author Email: Hongna Ye (yehongna@qq.com)

    DOI:10.3788/cjl201138.1108001

    Topics