Chinese Journal of Lasers, Volume. 29, Issue s1, 185(2002)
Study of the Dynamic Plasma Resistance in CuBr Laser with Hydrogen Additive
The electro-optics pulse waveforms and dynamic plasma resistances are measured and ccmpared with and without hydrogai additive. It is found that the peak of the discharge voltage increased about 34% and the amplitude of pulse current reduced approximately 23%, meanwhile the dynamic plasma resistance increased about 2 times with 2% hydrogen additive in Ne buffer gas. The reason for this phenomena and mechanism with hydrogen additive are discussed and presented.
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CHEN Gang, PAN Bai-liang, YAO Zhi-xin. Study of the Dynamic Plasma Resistance in CuBr Laser with Hydrogen Additive[J]. Chinese Journal of Lasers, 2002, 29(s1): 185
Category: laser devices and laser physics
Received: --
Accepted: --
Published Online: Feb. 23, 2013
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CSTR:32186.14.