Effect of Different Substrate Materials on Focusing Beam Performance of EUV Collector

Wanlu Xie; Xiaobin Wu; Kuibo Wang; Yan Luo; Yu Wang

doi:10.3788/LOP57.173401

Laser & Optoelectronics Progress, Volume. 57, Issue 17, 173401(2020)

Effect of Different Substrate Materials on Focusing Beam Performance of EUV Collector

Wanlu Xie, Xiaobin Wu^*, Kuibo Wang, Yan Luo, and Yu Wang

R & D Center of Optoelectronic Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China

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Figures & Tables(9)

Fig. 1. Optical path of EUV collection system

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Fig. 2. Simulation model of EUV collector

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Fig. 3. Temperature distribution of different collecting mirror reflection surfaces. (a) Fused silica; (b) SiC; (c) AlSi

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Fig. 4. Structural deformation distribution of different collecting mirror reflection surfaces. (a) Fused silica; (b) SiC; (c) AlSi

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Fig. 5. Spot diagrams of collection mirror after deformation. (a) Non-deformation; (b) fused silica; (c) SiC; (d) AlSi

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Table 1. Characteristic parameters of fused silica, SiC, AlSi substrate, and Al support

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Table 1. Characteristic parameters of fused silica, SiC, AlSi substrate, and Al support

Parameter	Fused silica	SiC	AlSi	Al
Thermal conductivity/[W/(m·K)]	1.30	360	140	247
Density /(g/cm³)	2.20	3.21	2.55	2.70
Young's ratio /GPa	72.7	450	110	71
Thermal expansion coefficient/(10^-6/K)	0.57	3.4	12	23.6
emissivity	0.93	0.85	0.35	0.3
Specific heat /[J/(kg·K)]	670	690	834	900
Poisson's ratio	0.17	0.142	0.35	0.33

Table 2. Temperature-rise of collection mirror ellipsoidal reflecting surface℃
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Table 2. Temperature-rise of collection mirror ellipsoidal reflecting surface℃
Temperature-rise Substrate material
Fused silica SiC AlSi
Minimum 5.64 1.34 1.37
Maximum 7.68 1.36 1.39

Table 3. Structural deformation of collection mirror ellipsoidal reflecting surfaceμm
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Table 3. Structural deformation of collection mirror ellipsoidal reflecting surfaceμm
Structuraldeformation Substrate material
Fused silica SiC AlSi
Maximum 1.60 1.11 3.51

Table 4. Focusing performance of different collection mirrors after deformation
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Table 4. Focusing performance of different collection mirrors after deformation
Substrate material
Non-deformation Fused silica SiC AlSi
GEO radius /μm 294.178 297.248 293.851 303.955
RMS radius /μm 225.253 225.282 225.256 225.281
WFE /λ 2.515 7.875 4.327 10.586

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Wanlu Xie, Xiaobin Wu, Kuibo Wang, Yan Luo, Yu Wang. Effect of Different Substrate Materials on Focusing Beam Performance of EUV Collector[J]. Laser & Optoelectronics Progress, 2020, 57(17): 173401

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Paper Information

Category: X-Ray Optics

Received: Dec. 13, 2019

Accepted: Dec. 24, 2019

Published Online: Sep. 1, 2020

The Author Email: Wu Xiaobin (wuxiaobin@ime.ac.cn)

DOI:10.3788/LOP57.173401

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology

Table 1. Characteristic parameters of fused silica, SiC, AlSi substrate, and Al support

Table 1. Characteristic parameters of fused silica, SiC, AlSi substrate, and Al support

Table 2. Temperature-rise of collection mirror ellipsoidal reflecting surface℃

Table 2. Temperature-rise of collection mirror ellipsoidal reflecting surface℃

Table 3. Structural deformation of collection mirror ellipsoidal reflecting surfaceμm

Table 3. Structural deformation of collection mirror ellipsoidal reflecting surfaceμm

Table 4. Focusing performance of different collection mirrors after deformation

Table 4. Focusing performance of different collection mirrors after deformation