Fig. 1. Flowchart of beam shaping based on double-phase checkerboard sampling.

Fig. 2. Complex amplitude beam shaping. (a) Schematic of the experimental setup. HWP, half-wave plate; SLM, spatial light modulator; M1, mirror; L₁, L₂, L₃, and L₄, lenses; MO₁ and MO₂, microscope objectives. (b) Intensity profile of the incident beam on the SLM captured with the CCD in the setup. (c) Schematic of the double-phase distribution loaded on the SLM after checkerboard sampling.

Fig. 3. Beam shaping efficiency η versus parameter Λ.

Fig. 4. Bessel beam generation based on DPH algorithm. (a) Top, input and target amplitude profiles. Bottom, target phase and the corresponding DPH map. (b) Longitudinal intensity profiles with white solid lines as the on-axis intensity distributions of the main lobe along propagation. Top, numerical simulations. Bottom, experimental results.

Fig. 5. Airy beam generation with DPH-based encoding method. (a), (d) Target phases and the corresponding DPH maps. (b), (e) Longitudinal intensity profiles with white dashed lines as the predefined Hook and parabolic trajectories (top, simulations; bottom, experiments). (c), (f) Intensity profiles in the selected cross sections.

Fig. 6. DPH-based intensity control. Amplitudes profiles, simulated (Sim.) and experimental (Exp.) 2D intensity maps with three tailored on-axis intensity profiles: (a1)–(a5) linearly increasing, (b1)–(b5) linearly decreasing, and (c1)–(c5) uniform. The input and the target amplitude profiles are compared in the first row of each column.

Fig. 7. Comparison of the efficiencies of the two complex amplitude modulation methods for generating Bessel beams. The insets schematically represent the corresponding target on-axis intensity profiles of each tailored Bessel beam.

Fig. 8. DPH-assisted 2PP. (a) Schematic of the 2PP setup. The first row of (b1)–(e1) shows the relative position between the photoresist and the structured light beams. The second row, (b2)–(e2), and the third row, (b3)–(e3), show the SEM photos of the resulting microstructure fabricated via 2PP with the insets presenting the transverse intensity profiles in the experiments. Scaling bars in (b2) and (b3) represent 50 µm and others represent 5 µm.