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Laser & Optoelectronics Progress, Volume. 59, Issue 9, 0922027(2022)

DSA in Combination with DUV Lithography for Sub-10 nm Manufacturing

Zili Li, Xiaohua Hu, and Shisheng Xiong*
Author Affiliations
  • School of Information Science and Technology, Fudan University, Shanghai 200438, China
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    Article index updated:May. 23, 2024

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    Zili Li, Xiaohua Hu, Shisheng Xiong. DSA in Combination with DUV Lithography for Sub-10 nm Manufacturing[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922027

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Feb. 10, 2022

    Accepted: Mar. 25, 2022

    Published Online: May. 10, 2022

    The Author Email: Xiong Shisheng (sxiong@fudan.edu.cn)

    DOI:10.3788/LOP202259.0922027

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology